Description
The ES40C-PS is the power supplywhich contains all circuits required to operate the electron source ES 40C, so that no additional apparatus is required.
Application
The ES40C-PS is equippedwith: Electron Emission Controller and Extractor Units provides heating for the cathode, extracting the electrons and keeping emission current at the desired level. Energy and FocusHigh VoltageUnits allowto setting of the electron beamenergy and focusing of the beam. Deflection unit allows to setting of the beamposition on the sample.
Additional information
All required voltages are supplied to Electron Sourcewith one high voltage plug. User Interface contains a large letters LCD display 2 x 20 chars, function keys and digital encoder to precisely control all parameterswhich can be stored and recalled. The last stored parameters are recalled after switching on the unit. The process parameters can be controlled by the computer through the RS-485 communication interface and dedicated application. The ES40C-PS ismounted in the 19” rack (full-width, 3 units height) or free standing.
| Specification |
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| Beam Energy | 1eV ÷ 5000eV at max 1mA; Error < 1V; Ripple < 0,2Vpp |
| Electron Current |
1µA – 1mA ; Error < 2% |
| Filament Current | 1A ÷ 2,2A at max 10V |
| Beam Focus |
1V ÷ 5000V at max 1mA,Error < 1V; Ripple <0,2Vpp |
| Beam Deflection | ± 650V for X and Y deflection plates |
| User Interface |
LCD text display 2 x 20 chars with Functions keys. Suitable digital encoder for precisely editing all parameters. A set of process parameters can be stored and recalled. |
| Communication | 2 wire EIA-485 for control all parameters by external computer. |
| Communication Interfaces |
EIA-232, 2 wire EIA-485, 4 wire EIA-485 |
| Dimensions (W x H x D) | 483 x 133 x 350 mm |
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