HV and UHV Systems

PREVAC offers custom deposition systems designed and manufactured to exact specifications for customer specific process applications. We can develop simple single-chamber systems for easy applications to complex multi-chamber computer-controlled systems for XPS, UPS, SPM, LEED, MBE and many different applications. Our systems can include a variety of deposition techniques, ion sources for substrate cleaning, electron beam evaporators, thermal evaporators for metals and organics, and many others. Our systems can be fully controlled and automated based on PLC controllers as well as intuitive and process based acquisition application. Standard systems can be equipped with IGOR Pro or CasaXPS analytical Software up to customer needs.

HV Systems

Vacuum Pumping System STS The STS is complex portable device for vacuum generation with TMP, which consists of an electronic control panel with LCD graphic display.	Vacuum Pumping Systems We provide complete vacuum systems that include instrumentation, controls, monitors, computer hardware and software, and other special equipment.
Universal Mass Spectrometer Multifunctional Wide Range of Pressure, Mass Analysis System for Thermal Desorption Spectroscopy (TDS).	High Vacuum Furanace A monochamber high vacuum furnace can elements used for baking details and components in HV conditions.
Spin Coater The Spin Coater is used for spin coating, a procedure to apply uniform thin film to flat substrates.

UHV Systems

Vacuum evaporator	Vacuum evaporator
UHV System PV228 Multichamber MBE system used to deposit thin magnetic structures via molecular beam epitaxy.	Multichamber analytical system designed for X-ray photoelectron spectroscopy(XPS), ultraviolet photoelectron spectroscopy (UPS) and ....
Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.	Analytical chamber designed for X-ray photoelectron spectroscopy (XPS), integrated with multichamber vacuum system for thin film deposition.
ESCA system for chemical analysis.	High-temperature system for investigation of interactions between liquid metals, alloys and refractory materials under non isothermal conditions.
UHV System PV010 Customized multi chamber UHV system dedicated for investigationof physical and chemical properties of metal surfaces.	UHV System PV014 Customized multi chamber UHV system dedicated for investigation of physical and chemical properties of metal surfaces.
UHV System PV015 Ultra High Vacuum System for preparation, characterization and investigation of the growth, diffusion, lattice dynamics and magnetism.	UHV System PV022 Customized multi chamber UHV system dedicated for analysis of atomic and electronic surface structure.
UHV System PV042 Customized multi chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.	UHV System PV043 One forte of the PV043 system is the ability to handle volatile samples throughout the entire system by cooling to liquid Nitrogen temperatures.
UHV System PV052 The PV052 system is used to: Research on thermodynamics and kinetics of phase transformation.	UHV System PV053 Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces...
UHV System PV063 Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.	UHV System PV092 Multichamber UHV system dedicated to surface analysis of solid and powdersamples by electron spectroscopy techniques.
UHVSystem PV093 Multifunctional UHV system.	UHV System PV097 Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.
UHV System PV116 The PV116 system is versatile R&D tool offering the flexibility of multi-deposition techniques in a single platform.	UHV System PV128 The PV128 magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

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