Multichamber MBE system used to deposit thin magnetic structures via molecular beam epitaxy.

designed for X-ray photoelectron spectroscopy(XPS), ultraviolet photoelectron spectroscopy (UPS) and ....

dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

designed for X-ray photoelectron spectroscopy (XPS), integrated with multichamber vacuum system for thin film deposition.

for chemical analysis.

for investigation of interactions between liquid metals, alloys and refractory materials under non isothermal conditions.

Customized multi chamber UHV system dedicated for investigationof physical and chemical properties of metal surfaces.

Customized multi chamber UHV system dedicated for investigation of physical and chemical properties of metal surfaces.

Ultra High Vacuum System for preparation, characterization and investigation of the growth, diffusion, lattice dynamics and magnetism.

Customized multi chamber UHV system dedicated for analysis of atomic and electronic surface structure.

Customized multi chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.

One forte of the PV043 system is the ability to handle volatile samples throughout the entire system by cooling to liquid Nitrogen temperatures.

The PV052 system is used to: Research on thermodynamics and kinetics of phase transformation.

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces...

Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.

Multichamber UHV system dedicated to surface analysis of solid and powdersamples by electron spectroscopy techniques.

Multifunctional UHV system.

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

The PV116 system is versatile R&D tool offering the flexibility of multi-deposition techniques in a single platform.

The PV128 magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.