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| Vacuum Evaporation |
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Quotation Inquiry |
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In the study of physics as well as in industry the use of thermal deposition to lay down thin films of metal is widespread. At PREVAC our system consists of a vacuum chamber, mechanical and turbo-molecular pumps, a high current low voltage circuit and a effusion cell. The substrate (the material to coat) is held in place in the vacuum chamber by tooling of our own design. The chamber is then pumped down to UHV conditions. With the two pumps in tandem we routinely reach pressures as low as 1x10-7 mbar. A plasma is then generated by introducing a small amount of inert gas such as argon or nitrogen and applying voltage. This ionized gas does a good job of releasing contaminants that cling to surfaces inside the chamber. The coating material must be heated to evaporative temperatures by passing current through the material. The evaporating metal then coats the substrate. We offer service of vacuum evaporation Al/Mg anodes used e.g. for x-ray photoelectron spectroscopy (XPS). ![]() ![]() |