1-2 axes MBE Manipulators
|Standard base flange||DN 100CF to DN 300CF (depending on the sample size, other on request)|
|Base pressure range||10-11 mbar|
|Shutter||integrated or external, pneumatic or manual|
|Heating methods||resistive, EB|
|Substrate temperature||up to 1200 °C (resistive)
up to 1400 °C (EB)
|Cooling method||LN2, H20|
|Z range||50 mm (other on request)
|resolution (manual/motorised)||500 μm / standard 10 μm|
|R1 range||360° continuous|
|XY range (option)
||± 12.5 mm|
|resolution (manual/motorised)||5 μm / 1 μm|
|Max speed||up to 60 rpm|
|Bakeout temperature||up to 150 °C / 200 °C (on request)|
* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
|Graphite||flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 500°C|
|Graphite + PBN coating||flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 800°C (depends on partial pressure of oxygen)|
|Graphite + SiC coating||hard, light and stable in form, oxidation resistant below 1400°C|
|SiC solid (β)||extremely hard, light and stable in form, low thermal expansion, durable to mechanical and electrical shocking, excellent resistance to reactive gases/oxidation|
The 1-2 axes motorised MBE manipulator is a high rigidity UHV specimen manipulator of modular construction, suitable for a range of R1 motorised continuous substrate rotation and Z translation.
It is prepared to heat the substrate up to 1400°C (EB heating, UHV conditions) with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.
The 1-2 axes motorised MBE manipulator is designed for MBE applications under ultra-high vacuum conditions. Heating is performed by resistive or EB methods. The manipulator can work in the vertical orientation.
Manipulator for MBE applications:
▪ sample holders: generally plate style
▪ prepared for reaching high temperature
▪ base pressure: 10-11 mbar
▪ H2O shroud
▪ LN2 or H2O cooling
▪ side or integrated wedge shutter (possible with H2O cooling option)
▪ XY movement stage
▪ shutter on/off