Deposition manipulators

1-2 axes MBE Manipulators

1-2 axes MBE Manipulators1/5

Technical data

Standard base flange DN 100CF to DN 300CF (depending on the sample size, other on request)
Base pressure range 10-11 mbar
Shutter integrated or external, pneumatic or manual
Heating methods resistive, EB
Substrate temperature up to 1200 °C (resistive)
up to 1400 °C (EB)
Cooling method LN2, H20
Z range 50 mm (other on request)
   positional control handwheel/motorised*
   resolution (manual/motorised) 500 μm / standard 10 μm
R1 range 360° continuous
   positional control motorised*
XY range (option)
± 12.5 mm
   positional control micrometer/motorised*
   resolution (manual/motorised) 5 μm / 1 μm
Max speed up to 60 rpm
Bakeout temperature up to 150 °C / 200 °C (on request)

* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.



Graphite flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 500°C
Graphite + PBN coating flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 800°C (depends on partial pressure of oxygen)
Graphite + SiC coating hard, light and stable in form, oxidation resistant below 1400°C
SiC solid (β) extremely hard, light and stable in form, low thermal expansion, durable to mechanical and electrical shocking, excellent resistance to reactive gases/oxidation

The 1-2 axes motorised MBE manipulator is a high rigidity UHV specimen manipulator of modular construction, suitable for a range of R1 motorised continuous substrate rotation and Z translation.

It is prepared to heat the substrate up to 1400°C (EB heating, UHV conditions) with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.


The 1-2 axes motorised MBE manipulator is designed for MBE applications under ultra-high vacuum conditions. Heating is performed by resistive or EB methods. The manipulator can work in the vertical orientation.

Manipulator for MBE applications:

▪ sample holders: generally plate style
▪ prepared for reaching high temperature
▪ base pressure: 10-11 mbar


▪ H2O shroud
▪ LN2 or H2O cooling
▪ side or integrated wedge shutter (possible with H2O cooling option)
▪ XY movement stage
▪ shutter on/off



this site uses cookie files.

We use information saved in cookie files, among others, in statistical purposes and in order to fit the service to individual needs of the user. In your browser you can change your cookie files settings.

Using the site without changing cookie files settings means they will be saved in device memory. More information with tips how to change settings can be found in Privacy policy.


Query list