Analytical systems

Advanced, multi-technique systems for UHV surface science

» XPS/UPS/ARPES system [project 511]

System dedicated for XPS (ESCA)/UPS/ARPES experiments in UHV conditions with controllable sample temperature.

» 5mbar XPS/UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 5 mbar - 10^-10 mbar with controllable sample temperature.

» Super resolution ARPES system with MBE chamber [project 523]

Multi-technique photo emission UHV system for super resolution ARPES measurements with integrated MBE chamber.

» MOKE system [project 516]

UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

» UHV-HP AFM System [project 539]

A unique AFM system ready to work in a range from UHV to 1 atm.

» High Pressure Photoemission Spectroscopy UHV System [project 487]

Superior performance analysis system for high pressure photoemission spectroscopy.

» TPD/TDS system

Stand-alone UHV unit for Temperature Programmed Desorption Spectroscopy.

» XPS UPS Photoelectron Spectrometer [project 454]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

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