Analytical systems

Advanced, multi-technique systems for UHV surface science

» XPS UPS system [project 511]

System dedicated for XPS (ESCA)/UPS experiments in UHV conditions with controllable sample temperature.

» 1mbar XPS UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 1 mbar - 10^-10 mbar with controllable sample temperature.

» Super resolution ARPES system with MBE chamber [project 523]

Multi-technique photo emission UHV system for super resolution ARPES measurements with integrated MBE chamber.

» MOKE system [project 516]

UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

» High Pressure Photoemission Spectroscopy UHV System [project 487]

» Analytical UHV system integrated with MBE chamber [project 473]

A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in UHV conditions integrated with MBE chamber.

» XPS UPS Photoelectron Spectrometer [project 454]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

» Multichamber UHV system [project 449]

Multichamber UHV system.

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