Analytical systems

Customised multitechnique UHV system [092]

Description

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques, especially:

  • X-ray Photoelectron Spectroscopy (XPS)
  • Ultraviolet Photoemission Spectroscopy (UPS)
  • Auger Electron Spectroscopy (AES)
  • Scanning Probe Microscopy (SPM)
  • Low Energy Electron Diffraction (LEED)
  • Temperature Programmed Desorption (TPD)

 

The system consists of:

  • spectroscopy chamber with analyzer (incl. instrumentation and software) which allows to use XPS, UPS, AES, EPS, TPD techniques. The analyzer enable XPS measurement with high resolution (<20mm), precise and depth profiling on selected surface ≤ 1x1mm, possibility of chemical imaging and angular-resolved measurement
  • variable temperature STM/AFM chamber with instrumentation and software which is dedicated to atomic resolution measurements
  • preparation chamber dedicated to preparing samples, equipped with AES/LEED spectrometer and thermal desorption spectrometer with residual gas analyzer (incl. instrumentation and software)

The system is additionally equipped with:

  • sample loading, transferring and storage
  • a device for sample preparing and cleaning
  • UHV Flow Through High Pressure Reactor dedicated to spectrometric and chromatographic gas analysis
  • gas dosing
  • pressure and temperature measurement and control system
  • vacuum controlling system
  • sample temperature measurement and control system

Measurement temperature range is 100-2300°K. The system allows independent and simultaneous use of electron spectroscopy techniques. The flexible design allows easy modification to meet future scientific demands.

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