Analytical systems

High resolution UPS and XPS system [project 317]

Description

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

Specification

The system designed for investigations and modifications of solid surfaces by XPS/UPS methods under very well controlled conditions. The base pressure in the analytical chambers is < 5*10-11 mbar.

  • Multifunctional analytical chamber integrates different measurement methods like standard ESCA, AES, ISS and UPS. A high precision, 4 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN2 and a heater for cooling and heating of the sample in a very wide temperature range. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, monochromatic X-ray source, UV source and prepared for many others. The equipment can be modified according to the customer demands.
  • Two levels preparation chamber, equipped with LEED, TDS, ion source, electron beam evaporator, mechanical surface cleaner, and many ports which can be used for future preparation or evaporation devices. The temperature on the sample depends on the sample holders and can vary from -180°C to 2000°C.
  • Load lock chamber prepared for dust samples pumping, with internal bakeout system.

Sample park chamber for 6 sample holders.

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» Components

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Used to grip and lift samples with a flat surface.

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Preparation Chamber

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For standard sample preparation techniques, thin film growth, sputtering, annealing and advanced preparation techniques with in-situ characterisation.

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Storage Chamber

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The storage chambers allow storage of up to 10 sample holders under UHV conditions.

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High precision UHV specimen translator having X, Y and Z motions.

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» Electronics

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Control the low power stepper motors in applications where high speed and high torque is not very important.

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Bakeout Control Unit BCU14

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Perfect unit dedicated for heating zones of the vacuum systems as well as heating samples inside the preparation chambers.

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Ion Multi Gauge Controller MG13

» Ion Multi Gauge Controller MG13

Supports 2 vacuum gauges: one Bayard-Alpert gauge and any others existing gauge on the market based on 0÷10 V output standard.

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Power Control Unit PCU16

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Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

 

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» Software

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