XPS/ESCA analytical UHV system [project 111]
A analytical UHV system HV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.
Analytical system with linear sample transport between chambers (analysis and load lock) under true UHV conditions. The base pressure in the analytical chamber is < 5*10-11 mbar. System is prepared to future extensions about radial distribution chamber with possibilities add another process chambers like: preparation, reactor or deposition chamber.
- Spherical multi technique analytical chamber integrating different surface analysis methods: X-ray Photoelectron Spectroscopy (XPS), Monochromatic Ultraviolet Photoelectron Spectroscopy (UPS). Sample positioning is via a very stable, high precision, 5-axis manipulator with two rotational axes motorised for automatic angular mapping. The sample receiving station is equipped with a LN2 cryostat that allows temperature variation over the range -180°C to 1000°C (dependent on sample holder model). The chamber is fabricated from mu-metal and equipped with a hemispherical analyzer with 2D detector, X-ray source, Ion source for depth profiling, Flood source,
- UHV vacuum system with combination of maglev turbo molecular pumps, ion pump and titanium sublimation pumps. The hemispherical analyzer is mounted in azimuthal position,
- Load lock chamber.