Analytical systems

XPS UPS Photoelectron Spectrometer [project 454]

Description

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

Specification

The system designed for investigations and modifications of solid surfaces by XPS/UPS methods under very well controlled conditions. The base pressure in the analytical chambers is < 5*10-11 mbar.

  • Multifunctional analytical chamber integrates different measurement methods like standard ESCA, AES, ISS and UPS. A high precision, 5 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN2 and a heater for cooling and heating of the sample in a very wide temperature range. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, monochromatic X-ray source, no monochromatic X-ray sorce, UV source and prepared for many others. The equipment can be modified according to the customer demands.
  • Two levels preparation chamber, equipped with LEED, TDS, ion source, electron beam evaporator, mechanical surface cleaner, and many ports which can be used for future preparation or evaporation devices. The temperature on the sample depends on the sample holders and can vary from -180°C to 2000°C.
  • Distribution Chamber for transferring sample holders to particular chambers connected on its circumference.
  • Cleaver chamber for cleaving the samples mounted in suitable sample holder.
  • High pressure chamber for heating up to 650°C and cooling the sample in controlled gas atmosphere under pressure to 2 MPa
  • Load lock chamber prepared for dust samples pumping, with internal bakeout system.
  • Sample park chamber for 6 sample holders.

Related products

» Systems

Ion Milling System <br> [project 557]

» Ion Milling System
[project 557]

UHV system for sample surface ion etching with high homogeneity.

read more
Multichamber XPS/UPS system for catalyst research [project 010]

» Multichamber XPS/UPS system for catalyst research [project 010]

A custom multi-chamber UHV system for the investigation of physical and chemical properties of novel catalyst materials.

read more
Deposition system with fully automated process control [project 458]

» Deposition system with fully automated process control [project 458]

Deposition HV system dedicated for: DC magnetron sputtering, RF magnetron sputtering, reactive sputtering and evaporation using electron beam.

read more
Sputter deposition system [project 500]

» Sputter deposition system [project 500]

Magnetron sputtering system dedicated to thin film layer deposition.

read more
See more  ›

» Components

PTS FARA sample holder

» PTS FARA sample holder

The PTS FARA sample holder has integrated Faraday Cup with secondary electron suppressor for beam profile measurements.

read more
Effusion Cell EF 40C1

» Effusion Cell EF 40C1

EF 40C1 Effusion Cell (Knudsen Cell) is a source designed for indirect resistive heating and delivering highly constant evaporation rates.

read more
Differentially Pumped Rotary Feedthroughs

» Differentially Pumped Rotary Feedthroughs

Provides 360° of continuous rotary freedom through the vacuum wall of a UHV system

read more
PTS 1200 DIR/C-K sample holder

» PTS 1200 DIR/C-K sample holder

The PTS with Direct Heating holder allows direct heating of the sample up to 1200°C and cooling down to -170°C.

read more
See more  ›

» Electronics

X-ray Source Emission Controller XR40B-EC

» X-ray Source Emission Controller XR40B-EC

The XR40B-EC electronic unit controls the X-ray source emission current.

read more
Motion Control 6

» Motion Control 6

Electronic device for controlling up to 6 stepper motors.

read more
Thickness Monitors TM13 & TM14

» Thickness Monitors TM13 & TM14

The TM13 and TM14 devices comprise: quartz oscillator, frequency measuring system and communication interface.

read more
Deposition Process Controller DPC10

» Deposition Process Controller DPC10

New electronic unit for deposition process controlling. Operates two independent sources/chambers at the same time.

read more
See more  ›

» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

read more
Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

read more
Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

read more
See more  ›

TOP
Newsletter

Important:
this site uses cookie files.

We use information saved in cookie files, among others, in statistical purposes and in order to fit the service to individual needs of the user. In your browser you can change your cookie files settings.

Using the site without changing cookie files settings means they will be saved in device memory. More information with tips how to change settings can be found in Privacy policy.

Close

Query list

Ask