Analytical systems

ARPES UHV system [project 418]

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The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.

Transferring system:

Flag Style sample holder

System configuration:

- Analysis chamber with double mu-metal liner guaranteed residual magnetic field lower than 0,1 microTesla and base pressure range 5*10^-11 mbar include:

Close cycle High resolution manipulator with LHe cooling (temperature on the sample down to 15K) – full motorized
Optimized for extremely demanded applications, high precision ARPES electron analyzer
Monochromatic UV source for UPS measurement with dedicated pumping system

- Load Lock chamber allows loading up to 12 Flag style sample holder

- Preparation chamber mounted on the top of analysis chamber which allows using one manipulator for both chamber, include:

Ion sputter source for sample cleaning
Deposition rate measurement system: Quartz Balance and Thickness monitor
Gold evaporator (Effusion cell)
LEED with multichannel plate for Leed /Auger measurement

- Storage Chamber including park mechanism for 12 Flag style sample holder

- Radial distribution chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures

- Accessories:

Set of dedicated, multifunctional, multimaterial sample holders
Special rack for all electronics unit
Special design bakeout system

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Multitechnique UHV system offering a wide range of surface characterisation techniques including XPS, UPS, ARPES, LEED.

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UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.