Analytical systems

ARPES UHV system [project 418]

ARPES UHV system [project 418]

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The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.

Transferring system:

Flag Style sample holder

System configuration:

- Analysis chamber with double mu-metal liner guaranteed residual magnetic field lower than 0,1 microTesla and base pressure range 5*10^-11 mbar include:

Close cycle High resolution manipulator with LHe cooling (temperature on the sample down to 15K) – full motorized
Optimized for extremely demanded applications, high precision ARPES electron analyzer
Monochromatic UV source for UPS measurement with dedicated pumping system

- Load Lock chamber allows loading up to 12 Flag style sample holder

- Preparation chamber mounted on the top of analysis chamber which allows using one manipulator for both chamber, include:

Ion sputter source for sample cleaning
Deposition rate measurement system: Quartz Balance and Thickness monitor
Gold evaporator (Effusion cell)
LEED with multichannel plate for Leed /Auger measurement

- Storage Chamber including park mechanism for 12 Flag style sample holder

- Radial distribution chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures

- Accessories:

Set of dedicated, multifunctional, multimaterial sample holders
Special rack for all electronics unit
Special design bakeout system

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» Multi-technique UHV surface analysis system [project 338]

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» Components

Z Chain Slides

» Z Chain Slides

Provides short strokes of Z travel with a wide range of bellows I.D.

Special Chambers

» Special Chambers

Custom designed and fabricated UHV chambers and complete vacuum systems for a wide range of applications.

Preparation Chamber

» Preparation Chamber

For standard sample preparation techniques, thin film growth, sputtering, annealing and advanced preparation techniques with in-situ characterisation.

1-3 axes Manipulators

» 1-3 axes Manipulators

Wide range of customised UHV manipulators with up to three othogonal axes XYZ.

» Electronics

X-ray Source Emission Controller XR40B-EC

» X-ray Source Emission Controller XR40B-EC

The XR40B-EC electronic unit controls the X-ray source emission current.

Deposition Process Controller DPC10

» Deposition Process Controller DPC10

New electronic unit for deposition process controlling. Operates two independent sources/chambers at the same time.

X-ray Source Electronics Set XR40B

» X-ray Source Electronics Set XR40B

XR40B electronics set is used to control the X-ray source RS 40B1.

Titanium Sublimation Pump Power Supply TSP03-PS

» Titanium Sublimation Pump Power Supply TSP03-PS

For constant filament current operation and features a thyristor and phase-control circuit for long-term and trouble-free TSP operation.

» Software

Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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