Analytical systems

ARPES UHV system [project 418]

The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.

Transferring system:

Flag Style sample holder

System configuration:

- Analysis chamber with double mu-metal liner guaranteed residual magnetic field lower than 0,1 microTesla and base pressure range 5*10-11 mbar include:

  • Close cycle High resolution manipulator with LHe cooling (temperature on the sample down to 15K) – full motorized
  • Optimized for extremely demanded applications, high precision ARPES electron analyzer
  • Monochromatic UV source for UPS measurement with dedicated pumping system

- Load Lock chamber allows loading up to 12 Flag style sample holder

- Preparation chamber mounted on the top of analysis chamber which allows using one manipulator for both chamber, include:

  • Ion sputter source for sample cleaning
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Gold evaporator (Effusion cell)
  • LEED with multichannel plate for Leed /Auger measurement

- Storage Chamber including park mechanism for 12 Flag style sample holder

- Radial distribution chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures

- Accessories:

  • Set of dedicated, multifunctional, multimaterial sample holders
  • Special rack for all electronics unit
  • Special design bakeout system

Related products

» Systems

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UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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High-temperature system [project 122]

» High-temperature system [project 122]

High-temperature system for investigation of interactions between liquid metals, alloys and refractory materials under non isothermal conditions.

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Magnetron sputtering system [project 128]

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The magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

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Ion Milling System <br> [project 557]

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[project 557]

UHV system for sample surface ion etching with high homogeneity.

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» Components

Infrared Chamber

» Infrared Chamber

Designed for IR spectroscopic investigations.

 

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Wobble Sticks with Rotating Tip

» Wobble Sticks with Rotating Tip

Mainly used to operate in vacuum mechanisms such as shutters, adjustment probes and variable orifices.

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Flow Through High Pressure Reactor

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Designed to study reactions between gases and solid/powder samples under high pressure (between reactor’s cups), in the reactor chamber under UHV conditions

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PTS SPM 2000 EB/C-C sample holder

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The PTS SPM 2000 EB/C-C sample holder is for SPM work and is equipped with electron beam sample heating up to 2000°C.

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» Electronics

X-ray Source Electronics Set XREC20

» X-ray Source Electronics Set XREC20

XREC20 electronics set dedicated for controlling SAX X-ray sources.

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X-ray Source Electronics Set XR40B

» X-ray Source Electronics Set XR40B

XR40B electronics set is used to control the X-ray source RS 40B1.

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Research Unit Digital Instrument RUDI-8M

» Research Unit Digital Instrument RUDI-8M

Modular, compact high voltage power supply for e.g. photoemission applications.

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Electron Source Power Supply ES40-PS

» Electron Source Power Supply ES40-PS

Allows fine adjustment of electron beam energy, density, position on the sample and also beam profile

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» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Spectrium

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Control and data acquisition software dedicated to EA15 class analysers.

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