ARPES UHV system [project 418]
The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.
Transferring system:
Flag Style sample holder
System configuration:
- Analysis chamber with double mu-metal liner guaranteed residual magnetic field lower than 0,1 microTesla and base pressure range 5*10-11 mbar include:
- Close cycle High resolution manipulator with LHe cooling (temperature on the sample down to 15K) – full motorized
- Optimized for extremely demanded applications, high precision ARPES electron analyzer
- Monochromatic UV source for UPS measurement with dedicated pumping system
- Load Lock chamber allows loading up to 12 Flag style sample holder
- Preparation chamber mounted on the top of analysis chamber which allows using one manipulator for both chamber, include:
- Ion sputter source for sample cleaning
- Deposition rate measurement system: Quartz Balance and Thickness monitor
- Gold evaporator (Effusion cell)
- LEED with multichannel plate for Leed /Auger measurement
- Storage Chamber including park mechanism for 12 Flag style sample holder
- Radial distribution chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures
- Accessories:
- Set of dedicated, multifunctional, multimaterial sample holders
- Special rack for all electronics unit
- Special design bakeout system