Analytical systems

ARPES UHV system [project 418]

The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.

Transferring system:

Flag Style sample holder

System configuration:

- Analysis chamber with double mu-metal liner guaranteed residual magnetic field lower than 0,1 microTesla and base pressure range 5*10-11 mbar include:

  • Close cycle High resolution manipulator with LHe cooling (temperature on the sample down to 15K) – full motorized
  • Optimized for extremely demanded applications, high precision ARPES electron analyzer
  • Monochromatic UV source for UPS measurement with dedicated pumping system

- Load Lock chamber allows loading up to 12 Flag style sample holder

- Preparation chamber mounted on the top of analysis chamber which allows using one manipulator for both chamber, include:

  • Ion sputter source for sample cleaning
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Gold evaporator (Effusion cell)
  • LEED with multichannel plate for Leed /Auger measurement

- Storage Chamber including park mechanism for 12 Flag style sample holder

- Radial distribution chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures

- Accessories:

  • Set of dedicated, multifunctional, multimaterial sample holders
  • Special rack for all electronics unit
  • Special design bakeout system

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» Components

Z Chain Slides

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Provides short strokes of Z travel with a wide range of bellows I.D.

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Special Chambers

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Custom designed and fabricated UHV chambers and complete vacuum systems for a wide range of applications.

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Preparation Chamber

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For standard sample preparation techniques, thin film growth, sputtering, annealing and advanced preparation techniques with in-situ characterisation.

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1-3 axes Manipulators

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Wide range of customised UHV manipulators with up to three othogonal axes XYZ.

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» Electronics

X-ray Source Emission Controller XR40B-EC

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The XR40B-EC electronic unit controls the X-ray source emission current.

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Deposition Process Controller DPC10

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New electronic unit for deposition process controlling. Operates two independent sources/chambers at the same time.

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X-ray Source Electronics Set XR40B

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» Software

Synthesium

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