Analytical systems

UHV multichamber system [project 422]

Multitechnique UHV system for FTIR investigations, equipped with MBE chamber and preparation module.

- IR Chamber allows infrared measurement in vacuum conditions:

  • Potassium bromide glass ports prepared system for use with the Bruker Optics Inc. infrared spectrometers.
  • High precision 4-axis manipulator with LN2 cooling and EB heating up to 2000°C allows measurement in both: reflection and transmission mode
  • Ion sputter source for sample cleaning
  • High precision Infrared Vacuum spectrometer with dedicated frame allows
  • Gas dosing system
  • Wide range pressure regulation system (1 mbar -10-10 mbar)

- Two-level Preparation chamber for non-organic materials:

  • High precision 4-axis manipulator with LN2 cooling and EB heating up to 2000°C
  • Ion sputter source for sample cleaning
  • Atomic Hydrogen Source
  • LEED –AUGER optics
  • Thermal Desorption Spectrometer TDS

- MBE chamber with cryoshield guarantee base pressure better than 1 x 10-10 mbar

  • High precision , special design 2-axes MBE manipulator with manual shutter, LN2 cooling and EB heating
  • Effusion Cell with operating temperature up to 1600°C
  • Electron Beam Evaporator
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Reflection high-energy electron diffraction RHEED 15 KeV
  • Plasma Atom Source

- Radial Distribution Chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures
- Load Lock chamber allows loading PTS sample holder
- Storage Chamber including park mechanism for 6 PTS sample holder
- Accessories:

  • Set of dedicated, multifunctional, multimaterial sample holders
  • Special rack for all electronics unit
  • Special design bakeout system
  • Spare parts

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» Components

Linear Shifts

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UHV transfer mechanism fabricated from a pair of flanges, connected by an edge welded bellows.

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R2/R3 Tilt Modules (combined with XY Stages)

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Provides short inclination in relation to one of the orthogonal directions (X or Y axis) in the ± 3° range.

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Effusion Cell EF 40C1

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EF 40C1 Effusion Cell (Knudsen Cell) is a source designed for indirect resistive heating and delivering highly constant evaporation rates.

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PTS 1000 OMC RES/C-K sample holder

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The PTS 1000 OMC RES/C-K sample holder adapts to flag style sample holders for systems that are equipped with STM.

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» Electronics

Power Control Unit PCU16

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Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

 

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Sample Heating Power Supply HEAT3-PS

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Power supply operated by touchscreen with dual mode heating (resistive and electron bombardment) and high efficiency.

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Compact switch-mode power supply designed to drive magnetron sources.

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» Software

Spectrium

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Control and data acquisition software dedicated to EA15 class analysers.

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New software dedicated to vacuum deposition applications.

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Application for Thermal Desorption Spectroscopy

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Used to control the power, preparing a recipe for heating and acquisition of measured data.

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