Analytical systems

UHV multichamber system [project 422]

Multitechnique UHV system for FTIR investigations, equipped with MBE chamber and preparation module.

- IR Chamber allows infrared measurement in vacuum conditions:

  • Potassium bromide glass ports prepared system for use with the Bruker Optics Inc. infrared spectrometers.
  • High precision 4-axis manipulator with LN2 cooling and EB heating up to 2000°C allows measurement in both: reflection and transmission mode
  • Ion sputter source for sample cleaning
  • High precision Infrared Vacuum spectrometer with dedicated frame allows
  • Gas dosing system
  • Wide range pressure regulation system (1 mbar -10-10 mbar)

- Two-level Preparation chamber for non-organic materials:

  • High precision 4-axis manipulator with LN2 cooling and EB heating up to 2000°C
  • Ion sputter source for sample cleaning
  • Atomic Hydrogen Source
  • LEED –AUGER optics
  • Thermal Desorption Spectrometer TDS

- MBE chamber with cryoshield guarantee base pressure better than 1 x 10-10 mbar

  • High precision , special design 2-axes MBE manipulator with manual shutter, LN2 cooling and EB heating
  • Effusion Cell with operating temperature up to 1600°C
  • Electron Beam Evaporator
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Reflection high-energy electron diffraction RHEED 15 KeV
  • Plasma Atom Source

- Radial Distribution Chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures
- Load Lock chamber allows loading PTS sample holder
- Storage Chamber including park mechanism for 6 PTS sample holder
- Accessories:

  • Set of dedicated, multifunctional, multimaterial sample holders
  • Special rack for all electronics unit
  • Special design bakeout system
  • Spare parts

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» Components

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» Electronics

Thickness Monitors TM13 & TM14

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» Software

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