Analytical systems

XPS UPS system [project 511]

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The surface analysis systems product line from PREVAC is based on highly flexible analysis tool optimised for XPS (ESCA), UPS, ISS and AES measurements. The energy resolution of the hemispherical analyser is < 3 meV (FWHM at 2 eV pass energy). Additional to the spectrometer a versatile control software is delivered which stores the data in an open-standard format (JSON) and allows exporting the data into various other formats (hdf5, ini, txt), which are used by different standalone XPS evaluation programs.

Analysis chamber - made of μ-metal, with connecting flanges for current and further equipment. Base pressure range 10^-10 mbar (after bakeout at 150 ºC),
EA15 hemispherical energy analyser - equipped with a total number of 11 slits, the analyzer offers the possibility to choose between best energy resolution and best intensity. Mean radius: 150 mm. Kinetic energy range: 0-2000 eV,
X-ray source RS 40B1 - high intensity twin anode X-ray source,
X-ray source with monochromator RMC50 with electronic set (emission controller, cooling box and HV power supply for operating both RMC50 and RS40B1 X-ray source),
UV source UVS 40A2,
RUDI-EA2 - high stable and low noise electronics,
SPECTRIUM - a progressive and optimized software tool in regard of handling and intuitive graphical interface,
4-5-6 axes, full motorised UHV manipulator (with heating & cooling),
Pumping system for analysis chamber and analytical components,
Gas dosing system for the analysis chamber.

Related products

» Components

» Analytical Chamber

Designed for applications requiring the investigation of the chemical and physical properties of solid state surfaces, thin films and nanomaterials.

» UV Source UVS 40A2

High intensity photon source that can be operated with a variety of discharge gases.

» X-ray Source RS 40B1

High intensity twin anode Al/Mg source optimized for XPS and high pressure XPS experiments.

» X-ray Source with Monochromator RMC50

Based on ellipsoidal quartz crystal and operates according to Bragg Law of X-ray diffraction.

» Electronics

» Research Unit Digital Instrument RUDI-EA2

Novel, modular high voltage power supply for photoemission and other demanding research applications.

» UV Source Power Supply UV40A-PS

For controlling the UV source UV40A1 in ultraviolet photoelectron spectroscopy (UPS) applications.

» X-ray Source Electronics Set XR40B

XR40B electronics set is used to control the X-ray source RS 40B1.

» Software

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

» Systems

» UHV Multichamber XPS - IR system [project 256]

Multitechnique IR-UHV system offering a wide range of surface characterisation techniques.

» High Pressure | Ambient Pressure XPS (ESCA) / UPS system [project 296]

Dedicated system for ambient pressure 1 mbar – 10^-10 mbar XPS (ESCA) / UPS experiments with controllable sample temperature from 100 K to 850 K in analysis chamber.

» Multichamber XPS/UPS system for catalyst research [project 010]

A custom multi-chamber UHV system for the investigation of physical and chemical properties of novel catalyst materials.

» Custom UHV system for OLED research [project 014]

A custom multichamber UHV system for the preparation and investigation of organic films (OLEDs).

» Multitechnique UHV system for multilayer epitaxial films [project 022]

Custom multi-chamber UHV system for the analysis of atomic and electronic surface structure, investigation and preparation of complex epitaxial metallic or molecular films on surfaces and chemical analysis of interfaces in multilayer film samples.

» Multichamber ESCA UHV system [project 053]

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

» Multifunctional UHV system [project 093]

Multifunctional UHV system for range of studies.

» Multichamber XPS UHV system [project 097]

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

» XPS system [project 212]

Analytical chamber designed for X-ray photoelectron spectroscopy (XPS), integrated with multichamber vacuum system for thin
film deposition.

» Multi-technique UHV surface analysis system [project 338]

Multitechnique UHV system offering a wide range of surface characterisation techniques including XPS, UPS, ARPES, LEED.

» Multichamber UHV system [project 080]

Multichamber UHV system dedicated to preparation of thin layers and complex analysis of surface solid samples with scanning probe microscopy and other research methods.

» Customised multitechnique UHV system [092]

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

» IR system [project 075]

A system designed for IR measurements.

» Multifunctional ESCA system [project 125]

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

» UHV MOKE system [project 164]

UHV MOKE system

» Scanning XPS system [project 279]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

» Multichamber UHV system [project 288]

Multichamber UHV system.

» High resolution UPS and XPS system [project 317]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

» XPS/ESCA analytical UHV system [project 111]

A analytical UHV system HV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

» Analytical UHV system [project 306]

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

» Ultra High Resolution Photoemission Spectrometer [project 351]

A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in low temperatures and UHV conditions.

» ARTOF Analysis System [project 390]

Dedicated system for ARTOF experiments with controllable sample temperature from 7 K to 400 K (PID controlled).

» Accelerator-analytical UHV system [project 412]

An analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

» UHV analytical system [project 428]

UHV system for positron annihilation and surface analysis.

» XPS UPS Photoelectron Spectrometer [project 454]

» ARPES UHV system [project 418]

The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.

» Multichamber UHV system [project 449]

Multichamber UHV system.

» Analytical UHV system integrated with MBE chamber [project 473]

A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in UHV conditions integrated with MBE chamber.

» UHV multichamber system [project 422]

Multitechnique UHV system for FTIR investigations, equipped with MBE chamber and preparation module.

» High Pressure Photoemission Spectroscopy UHV System [project 487]

Superior performance analysis system for high pressure photoemission spectroscopy.

» XPS UPS system [project 511]

System dedicated for XPS (ESCA)/UPS experiments in UHV conditions with controllable sample temperature.

» 5mbar XPS UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 5 mbar - 10^-10 mbar with controllable sample temperature.

» MOKE system [project 516]

UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

» Super resolution ARPES system with MBE chamber [project 523]

Multi-technique photo emission UHV system for super resolution ARPES measurements with integrated MBE chamber.

» UHV-HP AFM System [project 539]

A unique AFM system ready to work in a range from UHV to 1 atm.