System dedicated for XPS (ESCA)/UPS experiments in pressure range 1 mbar - 10-10 mbar with controllable sample temperature. Equipment provides full PLC protection and software control including clear visualization of the machine state, data acquisition, control of all integrated devices, power supplies and ancillary.
Analysis chamber - made of μ-metal, with connecting flanges for current and further equipment. Base pressure range 10-10 mbar (after bakeout at 120 ºC),
EA15-HP1 hemispherical energy analyser (XPS/UPS) - equipped with a total number of 11 slits, the analyzer offers the possibility to choose between best energy resolution and best intensity. Mean radius: 150 mm. Kinetic energy range: 0-2000 eV,
X-ray source with monochromator RMC50 (HP version) with electronic set (emission controller, cooling box and HV power supply for operating both RMC50 and RS40B1 X-ray source),
UV source UVS 40A2,
RUDI-EA2 - high stable and low noise electronics,
SPECTRIUM - a progressive and optimized software tool in regard of handling and intuitive graphical interface,
4-axes, full motorised UHV manipulator (with heating & LN2 cooling) for PTS sample holders,
Pumping system for analysis chamber, HP analyser and analytical components,
Dedicated system for ambient pressure 1 mbar – 10-10 mbar XPS (ESCA) / UPS experiments with controllable sample temperature from 100 K to 850 K in analysis chamber.
Custom multi-chamber UHV system for the analysis of atomic and electronic surface structure, investigation and preparation of complex epitaxial metallic or molecular films on surfaces and chemical analysis of interfaces in multilayer film samples.
Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.
Multichamber UHV system dedicated to preparation of thin layers and complex analysis of surface solid samples with scanning probe microscopy and other research methods.
Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.
The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.
The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.
A analytical UHV system HV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.
Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.
A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in low temperatures and UHV conditions.
An analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.
The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.
A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in UHV conditions integrated with MBE chamber.
UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.
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