Analytical systems

MOKE system [project 516]

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UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

Base pressure range 10^-10 mbar after bakeout at 150 °C
Magnetic poles arranged perpendicularly to the sample
Field beetwen magnetic poles > 0,17 Tesla
4-axes UHV sample manipulator for flag sample holders
Sample heating up to 800 °C & cooling with LN₂
Optical system for MOKE chamber (modulator, polaryzers, photodetector, laser)
Whole chamber with equipment is mounted on the positioning stage
Vacuum suitcase for sample easy transport

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» Components

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» Deposition holders

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The PTS 200 RES sample holder features a heated, rotating wire of 129mm L and 0.5mm dia (max) for vapor deposition experiments.

» Electronics

» X-ray Source Emission Controller XR40B-EC

The XR40B-EC electronic unit controls the X-ray source emission current.

» Power Control Unit PCU16

Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

» Research Unit Digital Instrument RUDI-8M

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» Stepper Motor Control Device SMCD14

Designed for controlling the low and high power stepper motors in applications.

» Software

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