Analytical systems

MOKE system [project 516]

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UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

Base pressure range 10^-10 mbar after bakeout at 150 °C
Magnetic poles arranged perpendicularly to the sample
Field beetwen magnetic poles > 0,17 Tesla
4-axes UHV sample manipulator for flag sample holders
Sample heating up to 800 °C & cooling with LN₂
Optical system for MOKE chamber (modulator, polaryzers, photodetector, laser)
Whole chamber with equipment is mounted on the positioning stage
Vacuum suitcase for sample easy transport

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