MOKE system [project 516]
UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.
- Base pressure range 10-10 mbar after bakeout at 150 °C
- Magnetic poles arranged perpendicularly to the sample
- Field beetwen magnetic poles > 0,17 Tesla
- 4-axes UHV sample manipulator for flag sample holders
- Sample heating up to 800 °C & cooling with LN2
- Optical system for MOKE chamber (modulator, polaryzers, photodetector, laser)
- Whole chamber with equipment is mounted on the positioning stage
- Vacuum suitcase for sample easy transport