Analytical systems

MOKE system [project 516]

UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

  • Base pressure range 10-10 mbar after bakeout at 150 °C
  • Magnetic poles arranged perpendicularly to the sample
  • Field beetwen magnetic poles > 0,17 Tesla
  • 4-axes UHV sample manipulator for flag sample holders
  • Sample heating up to 800 °C & cooling with LN2
  • Optical system for MOKE chamber (modulator, polaryzers, photodetector, laser)
  • Whole chamber with equipment is mounted on the positioning stage
  • Vacuum suitcase for sample easy transport

Related products

» Systems

Analytical UHV system integrated with MBE chamber [project 473]

» Analytical UHV system integrated with MBE chamber [project 473]

A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in UHV conditions integrated with MBE chamber.

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XPS/ESCA analytical UHV system [project 111]

» XPS/ESCA analytical UHV system [project 111]

A analytical UHV system HV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

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Magnetron sputtering system [project 229]

» Magnetron sputtering system [project 229]

Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition.

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5mbar XPS/UPS system [project 522]

» 5mbar XPS/UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 5 mbar - 10-10 mbar with controllable sample temperature.

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» Components

Radial Distribution Chamber (UFO)

» Radial Distribution Chamber (UFO)

Designed to transfer samples between multiple analysis, deposition or preparation chambers that are connected to it.

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Double Filament Effusion Cell EF 40C1DF

» Double Filament Effusion Cell EF 40C1DF

EF 40C1DF Double Filament Effusion Cell is a source with two independently operated filaments for greater convenience in the evaporation process.

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Deposition holders

» Deposition holders

Sample holders (substrate holders, plates, wafers, molyblocs) dedicated for different deposition techniques, such as MBE, magnetron sputtering, thermal evaporation and others.

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PTS 200 RES sample holder

» PTS 200 RES sample holder

The PTS 200 RES sample holder features a heated, rotating wire of 129mm L and 0.5mm dia (max) for vapor deposition experiments.

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» Electronics

X-ray Source Emission Controller XR40B-EC

» X-ray Source Emission Controller XR40B-EC

The XR40B-EC electronic unit controls the X-ray source emission current.

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Power Control Unit PCU16

» Power Control Unit PCU16

Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

 

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Research Unit Digital Instrument RUDI-8M

» Research Unit Digital Instrument RUDI-8M

Modular, compact high voltage power supply for e.g. photoemission applications.

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Stepper Motor Control Device SMCD14

» Stepper Motor Control Device SMCD14

Designed for controlling the low and high power stepper motors in applications.

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» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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