Analytical systems

Super resolution ARPES system with MBE chamber [project 523]

Super resolution ARPES system with MBE chamber [project 523]

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Multi-technique photo emission UHV system for super resolution ARPES measurements with integrated MBE chamber.
System setup consists:
▪ Analysis chamber: base pressure 10^-11 mbar range,
▪ MBS ultra high resolution photoelectron analyser with wide angle acceptance lens.
▪ PREVAC RMC50 monochromatic X-ray source
▪ High resolution and sensitivity LEED-AES spectrometer
▪ 5-axes manipulator with LHe cooling (open cycle) for analysis chamber
▪ MBE chamber: base pressure range 2x10^-10 mbar
▪ 15kV electrostatic focused RHEED electron-source
▪ 4-axes manipulator with RES heating up to 1000 °C and LN₂ cooling for MBE chamber
▪ Transferring system with load lock and storage chambers for 12 flag style sample holders
▪ Additional equipment: ion source IS 40C1, flood source FS 40A1, effusion cells, electron beam evaporator EBV 40A1, quartz balance QO 40A1 and others.

Related products

» Components

Electron beam evaporator EBV 40A1

» Electron beam evaporator EBV 40A1

The electron beam evaporator EBV 40A1 is designed for ultra-pure sub-monolayer and multilayer MBE thin film growth.

Flood Source FS 40A1

» Flood Source FS 40A1

Low cost electron flood source for charge neutralisation of insulators or semiconductors in XPS/AES and SIMS applications.

Ion Source IS 40C1

» Ion Source IS 40C1

Compact, easy-to-use extractor type ion gun for sample surface cleaning.

Quartz Balance QO 40A1

» Quartz Balance QO 40A1

The Quartz Balance QO 40A1 provides a real-time, progressive indication of coating thickness during deposition, for high accuracy and reproducibility in coatings production.

X-ray Source with Monochromator RMC50

» X-ray Source with Monochromator RMC50

Based on ellipsoidal quartz crystal and operates according to Bragg Law of X-ray diffraction.

» Electronics

Ion Source Power Supply IS40-PS

» Ion Source Power Supply IS40-PS

The IS40-PS is a high stability & low noise power supply, which can be configured to work with IS40C1 or IS40E1 Ion source.

Thickness Monitors Controller TMC-13

» Thickness Monitors Controller TMC-13

Newest technology electronics designed for monitoring and controlling any coating and deposition processes.

Thickness Monitors TM13 & TM14

» Thickness Monitors TM13 & TM14

The TM13 and TM14 devices comprise: quartz oscillator, frequency measuring system and communication interface.

X-Ray Source Electronics XR40B

» X-Ray Source Electronics XR40B

XR40B-EC Emission controller is used to control the emission current of the X-ray source RS 40B1.

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