Analytical systems

UHV-HP AFM System [project 539]

UHV-HP AFM platform is a unique analysis system for Atomic Force Microscopy working in wide pressure range. It is focused on a highly flexible sample environment, dedicated for use in frontier research on gas-solid interfaces. The System is equipped with fast entry load-lock and preparation chamber.

  • AFM chamber - made of stainless steel, with connecting flanges in different size for current and further equipment. Operational pressure range from 1 atm to UHV (after bakeout at 150 ºC),
  • Special sliding rails for AFM module to facilitate service access to the microscope,
  • Load Lock chamber allows for loading and store up to 4 flag style sample holders and 4 cantilevers (tips),
  • Two-level preparation chamber with 4-axes manipulator (with integrated quartz balance and heating possibility up to 1000 °C),
  • Preparation chamber equipped with Electron Beam Evaporator EBV 40A1 and Ion Source IS 40C1 for sample surface cleaning,
  • Special design pumping system - vibration isolation of forevacuum and turbomolecular pump,
  • Deposition rate measurement system TMC13 and Sample Heating Power Supply HEAT3-PS to control and stabilize the sample temeperature,
  • Whole pumping & gas dosing systems are controlled by PLC controller,
  • User-friendly linear transferring system.

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» Components

Hemispherical Energy Analyser EA15-HP

» Hemispherical Energy Analyser EA15-HP

The EA15-HP allows high-resolution PES measurements in static and dynamic environments up to 50 mbar.

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Wobble Sticks with Gripping Arms

» Wobble Sticks with Gripping Arms

Used to grip and lift samples with a flat surface.

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PTS 1200 DIR/C-K sample holder

» PTS 1200 DIR/C-K sample holder

The PTS with Direct Heating holder allows direct heating of the sample up to 1200°C and cooling down to -170°C.

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PTS 700/-90 HPC RES/C-K RG PS sample holder

» PTS 700/-90 HPC RES/C-K RG PS sample holder

The PTS HPC RES/C-K RG Sample Holder is for high pressure, reactive gas studies of powdered catalyst samples.

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» Electronics

X-ray High Voltage Power Supply XRHV01-PS

» X-ray High Voltage Power Supply XRHV01-PS

High voltage power supply for X-ray source RS 40B1.

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Thickness Monitors Controller TMC-13

» Thickness Monitors Controller TMC-13

Newest technology electronics designed for monitoring and controlling any coating and deposition processes.

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X-ray Source Emission Controller XR40B-EC

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The XR40B-EC electronic unit controls the X-ray source emission current.

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Vacuum Chamber Highlight VCH-10

» Vacuum Chamber Highlight VCH-10

Perfect accessory for illuminating sample areas, source/accessory positions and movement regions within a UHV system.

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» Software

Application for Thermal Desorption Spectroscopy

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Spectrium

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