Analytical systems

UHV-HP AFM System [project 539]

UHV-HP AFM platform is a unique analysis system for Atomic Force Microscopy working in wide pressure range. It is focused on a highly flexible sample environment, dedicated for use in frontier research on gas-solid interfaces. The System is equipped with fast entry load-lock and preparation chamber.

  • AFM chamber - made of stainless steel, with connecting flanges in different size for current and further equipment. Operational pressure range from 1 atm to UHV (after bakeout at 150 ºC),
  • Special sliding rails for AFM module to facilitate service access to the microscope,
  • Load Lock chamber allows for loading and store up to 4 flag style sample holders and 4 cantilevers (tips),
  • Two-level preparation chamber with 4-axes manipulator (with integrated quartz balance and heating possibility up to 1000 °C),
  • Preparation chamber equipped with Electron Beam Evaporator EBV 40A1 and Ion Source IS 40C1 for sample surface cleaning,
  • Special design pumping system - vibration isolation of forevacuum and turbomolecular pump,
  • Deposition rate measurement system TMC13 and Sample Heating Power Supply HEAT3-PS to control and stabilize the sample temeperature,
  • Whole pumping & gas dosing systems are controlled by PLC controller,
  • User-friendly linear transferring system.

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» Systems

Magnetron sputtering system [project 229]

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Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition.

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XPS/UPS/ARPES system [project 511]

» XPS/UPS/ARPES system [project 511]

System dedicated for XPS (ESCA)/UPS/ARPES experiments in UHV conditions with controllable sample temperature.

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Multichamber ARPES UHV system [project 042]

» Multichamber ARPES UHV system [project 042]

The ARPES system is a customised multi-chamber UHV sys­tem for the investigation of physical properties (electronic band structure) of high temperature super­conductors.

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UHV deposition system [project 373]

» UHV deposition system [project 373]

Modular platform for thin layers deposition.

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» Components

PTS QUARTZ sample holder

» PTS QUARTZ sample holder

The PTS QUARTZ sample holder is equipped with integrated quartz balance for deposition rate measurements.

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Linear Shifts

» Linear Shifts

UHV transfer mechanism fabricated from a pair of flanges, connected by an edge welded bellows.

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1-4 axes PLD Target Manipulators

» 1-4 axes PLD Target Manipulators

Designed for target positioning in pulsed laser deposition applications.

 

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PTS SPM CLEAV sample holder

» PTS SPM CLEAV sample holder

The PTS SPM Cleav sample holder combines sample cleaving capabilities with SPM compatibility over the temperature range -170°C to 600°C (indirectly heated).

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» Electronics

Thickness Monitors Controller TMC-13

» Thickness Monitors Controller TMC-13

Newest technology electronics designed for monitoring and controlling any coating and deposition processes.

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Flood Source Power Supply FS40-PS

» Flood Source Power Supply FS40-PS

New power supply with touchscreen dedicated for Flood Source FS40A1.

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Power Control Unit PCU16

» Power Control Unit PCU16

Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

 

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Motion Control 6

» Motion Control 6

Electronic device for controlling up to 6 stepper motors.

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» Software

Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Synthesium

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New software dedicated to vacuum deposition applications.

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