Analytical systems

UHV-HP AFM System [project 539]

UHV-HP AFM platform is a unique analysis system for Atomic Force Microscopy working in wide pressure range. It is focused on a highly flexible sample environment, dedicated for use in frontier research on gas-solid interfaces. The System is equipped with fast entry load-lock and preparation chamber.

  • AFM chamber - made of stainless steel, with connecting flanges in different size for current and further equipment. Operational pressure range from 1 atm to UHV (after bakeout at 150 ºC),
  • Special sliding rails for AFM module to facilitate service access to the microscope,
  • Load Lock chamber allows for loading and store up to 4 flag style sample holders and 4 cantilevers (tips),
  • Two-level preparation chamber with 4-axes manipulator (with integrated quartz balance and heating possibility up to 1000 °C),
  • Preparation chamber equipped with Electron Beam Evaporator EBV 40A1 and Ion Source IS 40C1 for sample surface cleaning,
  • Special design pumping system - vibration isolation of forevacuum and turbomolecular pump,
  • Deposition rate measurement system TMC13 and Sample Heating Power Supply HEAT3-PS to control and stabilize the sample temeperature,
  • Whole pumping & gas dosing systems are controlled by PLC controller,
  • User-friendly linear transferring system.

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» Systems

IR system [project 075]

» IR system [project 075]

A system designed for IR measurements.

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XANELS XPS ultra high vacuum system [project 043]

» XANELS XPS ultra high vacuum system [project 043]

UHV system designed to operate as both a stand-alone device or as an end station in synchrotron installations.

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Deposition system with door access [project 244]

» Deposition system with door access [project 244]

Deposition system which offers the flexibility of several techniques in a single chamber.

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5mbar XPS UPS system [project 522]

» 5mbar XPS UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 5 mbar - 10-10 mbar with controllable sample temperature.

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» Components

Flag style sample holders

» Flag style sample holders

Commonly used sample holder for a wide range of applications.

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Static High Pressure Reactor

» Static High Pressure Reactor

Designed to facilitate high pressure (up to 1 bar) experiments with various reaction gases.

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Electron Source ES 40C1

» Electron Source ES 40C1

Scanable electron gun with small spot profile.

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Hemispherical Energy Analyser EA15-HP

» Hemispherical Energy Analyser EA15-HP

The EA15-HP allows high-resolution PES measurements in static and dynamic environments up to 50 mbar.

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» Electronics

Bakeout Control Unit BCU14

» Bakeout Control Unit BCU14

Perfect unit dedicated for heating zones of the vacuum systems as well as heating samples inside the preparation chambers.

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Wien Filter Power Supply IS40-WPS

» Wien Filter Power Supply IS40-WPS

Power Supply for Wien Mass Filter (Ion Source IS 40E1).

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Ion Multi Gauge Controller MG15

» Ion Multi Gauge Controller MG15

Able to support 4 active gauges and up to 3 passive gauges, extending the measurement range to 2×10-12 mbar.

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Vacuum Chamber Highlight VCH-10

» Vacuum Chamber Highlight VCH-10

Perfect accessory for illuminating sample areas, source/accessory positions and movement regions within a UHV system.

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» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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» Synthesium

New software dedicated to vacuum deposition applications.

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