Analytical systems

Multifunctional UHV system [project 093]

Description

Multifunctional UHV system for the following studies:

  • interaction of electrons and photons with atoms, molecules and clusters from (supersonic) crossed molecular beams
  • various plasma discharges
  • interaction of accelerated atoms, molecules and charged particles with surfaces
  • surface sorption/desorption processes
  • thin film deposition
  • in-situ determination of the geometry, structure, composition and properties of thin films

Specification

In situ sample transfer between each chamber and analytical chamber. Equipped with combined electron spectroscopy techniques (Auger, XPS, UPS)
Nozzle chamber (NC) with pulsed nozzle source for supersonic molecular beam (SMB) production including:

  • pulsed nozzle - (pressure up to 10 bar, opening time 0.1 - 10 msec, frequency 1-100Hz)
  • nozzle transfer system under vacuum conditions along X (up to 70 mm), Y (up to 10 mm) and Z (up to 10 mm)
  • fixed skimmer
  • sapphire windows (DN 64 - 100)
  • intermediate device for connection with VUV spectrometer
  • NC is connected to a separate vacuum chamber for initial gas mixture preparation (pressure 0.001 - 1500 Torr)
  • Intermediate chamber (IC)
  • ion optics for TOF mass spectrometer. TOF m/s - 1-10 000 a.m.u. M/dM ~ 2000
  • sapphire windows (DN 64-100)
  • electron gun (Uak= 0-300 V, HW= 0.1 eV)
  • TPD/S spectrometer (time programmed heating of sample + quadruple m/s) - precise moveable sample holder to install sample on axis of molecular beam
  • transfer system to move samples from IC to analytical chamber (AC)
  • effusion cells for thin film deposition
  • ion gun (cleaning of sample surface)

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