UARPES End Station [project 453]
This multifunctional UHV system is designed for precise and varied analysis of material surfaces.
- The system consists of a main frame of fixed vacuum chambers: analysis chamber, preparation chamber, load lock chamber and linear transfers. The base pressure in the analytical chambers is < 5*10-11 mbar.
- Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS and LEED. Fabricated from mu-metal and designed for energy resolution better then 0.5 meV
- Horizontally mounted analyzer can be easily rotated by 90 degrees.
- The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER)