Analytical systems for synchrotrons

UARPES End Station [project 453]

Description

This multifunctional UHV system is designed for precise and varied analysis of material surfaces.

Specification

  • The system consists of a main frame of fixed vacuum chambers: analysis chamber, preparation chamber, load lock chamber and linear transfers. The base pressure in the analytical chambers is < 5*10-11 mbar.
  • Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS and LEED. Fabricated from mu-metal and designed for energy resolution better then 0.5 meV
  • Horizontally mounted analyzer can be easily rotated by 90 degrees.
  • The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER)

Related products

» Systems

Deposition system with door access [project 236]

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Deposition system offer the flexibility of several techniques in a single chamber.

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MBE system [project 531]

» MBE system [project 531]

Stand-alone MBE sytem with fast intro chamber.

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Multichamber XPS UHV system [project 097]

» Multichamber XPS UHV system [project 097]

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

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Deposition system with door access [project 334]

» Deposition system with door access [project 334]

Deposition system which offers the flexibility of several techniques in a single chamber.

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» Components

Wobble Sticks with Rotating Tip

» Wobble Sticks with Rotating Tip

Mainly used to operate in vacuum mechanisms such as shutters, adjustment probes and variable orifices.

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Load Lock Chamber

» Load Lock Chamber

Provides a fast and clean method of introducing samples into UHV systems.

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1-4 axes PLD Target Manipulators

» 1-4 axes PLD Target Manipulators

Designed for target positioning in pulsed laser deposition applications.

 

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Hemispherical Energy Analyser EA15

» Hemispherical Energy Analyser EA15

The EA15 provides high-resolution PES measurements with a 150 mm mean radius analyser.

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» Electronics

Vacuum Chamber Highlight VCH-10

» Vacuum Chamber Highlight VCH-10

Perfect accessory for illuminating sample areas, source/accessory positions and movement regions within a UHV system.

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Research Unit Digital Instrument RUDI-EA2

» Research Unit Digital Instrument RUDI-EA2

Novel, modular high voltage power supply for photoemission and other demanding research applications.

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Thickness Monitors TM13 & TM14

» Thickness Monitors TM13 & TM14

The TM13 and TM14 devices comprise: quartz oscillator, frequency measuring system and communication interface.

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Ion Source Power Supply IS40-PS

» Ion Source Power Supply IS40-PS

High stability & low noise power supply, which can be configured to work with IS40C1 or IS40E1 Ion Sources.

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» Software

Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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