Analytical systems for synchrotrons

UARPES End Station [project 453]

Description

This multifunctional UHV system is designed for precise and varied analysis of material surfaces.

Specification

  • The system consists of a main frame of fixed vacuum chambers: analysis chamber, preparation chamber, load lock chamber and linear transfers. The base pressure in the analytical chambers is < 5*10-11 mbar.
  • Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS and LEED. Fabricated from mu-metal and designed for energy resolution better then 0.5 meV
  • Horizontally mounted analyzer can be easily rotated by 90 degrees.
  • The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER)

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» Components

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» Electronics

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» Software

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