Analytical systems for synchrotrons

Super resolution ARPES system [project 158]

Description

Customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.

  • Central radial distribution chamber with attached analytical chamber and auxiliary chambers allows transport of samples under true UHV conditions (pressure
  • Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS and LEED. Fabricated from mu-metal and designed for energy resolution better then 0.5 meV
  • Can be used in the laboratory as well as on a synchrotron beam line.
  • Horizontally mounted analyser can be easily rotated by 90 degrees.
  • The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER)

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» Systems

Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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UHV deposition system [project 373]

» UHV deposition system [project 373]

Modular platform for thin layers deposition.

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HIPIMS system [project 335]

» HIPIMS system [project 335]

The HIPIMS Reactor is a dual purpose deposition chamber. It allows accurate and reproducible thin film layer deposition and extensive plasma diagnostic investigation.

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Accelerator-analytical UHV system [project 412]

» Accelerator-analytical UHV system [project 412]

An analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

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» Components

PTS BASE CONTAINER sample holder

» PTS BASE CONTAINER sample holder

The PTS BASE CONTAINER SAMPLE HOLDER is designed as an adapter to accept samples up to 50mm diameter and 7.5mm thick.

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Z Slide

» Z Slide

The Z Slide is a precision, high rigidity UHV specimen translator having Z motion.

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Titanium Sublimation Pump

» Titanium Sublimation Pump

The Titanium Sublimation Pump (TSP) is a true UHV pump.

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Analytical Chambers

» Analytical Chambers

Analytical chambers are designed for applications requiring the investigation of the chemical and physical properties of solid state surfaces, thin films and nanomaterials.

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» Electronics

Flood Source Power Supply FS40A-PS

» Flood Source Power Supply FS40A-PS

The Flood Source Power Supply FS40A-PS is dedicated to supply Flood Source FS40A1 or FS40A2.

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Heating Power Supply HEAT3-PS

» Heating Power Supply HEAT3-PS

Power supply operated by completely intuitive touch screen with dual mode heating (resistive and electron bombardment) and high efficiency.

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Thickness Monitors Controller TMC-13

» Thickness Monitors Controller TMC-13

TMC13 is the newest technology electronics designed for monitoring and controlling any coating and deposition processes.

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» Software

Heater Power Supply Control

» Heater Power Supply Control

Full software control of current and voltage.

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Bakeout Control

» Bakeout Control

Full software control of bakeout time and temperature.

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Electron Beam Evaporator Control

» Electron Beam Evaporator Control

Electron Beam Evaporator Controller software extension for data acquisition and convenient control.

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Residual Gas Analyzer

» Residual Gas Analyzer

The RGA module allows fully functional control of residual gas analyzers.

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