Analytical systems for synchrotrons

Super resolution ARPES system [project 158]

Super resolution ARPES system [project 158]

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Description

Customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.

Central radial distribution chamber with attached analytical chamber and auxiliary chambers allows transport of samples under true UHV conditions (pressure
Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS and LEED. Fabricated from mu-metal and designed for energy resolution better then 0.5 meV
Can be used in the laboratory as well as on a synchrotron beam line.
Horizontally mounted analyser can be easily rotated by 90 degrees.
The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER)

Related products

» Systems

UHV system for thin film evaporation [project 382]

» UHV system for thin film evaporation [project 382]

Customized deposition system dedicated for thin films organic materials deposition.

UHV system [project 063]

» UHV system [project 063]

Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.

UHV system for synchrotron experimental station [project 536]

» UHV system for synchrotron experimental station [project 536]

Experimental station dedicated for photoelectron spectroscopy and X-ray absorption spectroscopy.

Multichamber ARPES UHV system [project 042]

» Multichamber ARPES UHV system [project 042]

The ARPES system is a customised multi-chamber UHV system for the investigation of physical properties (electronic band structure) of high temperature superconductors.

» Components

PTS SPM 2000 EB/C-C sample holder

» PTS SPM 2000 EB/C-C sample holder

The PTS SPM 2000 EB/C-C sample holder is for SPM work and is equipped with electron beam sample heating up to 2000°C.

Ion Source IS 40E1

» Ion Source IS 40E1

Two lens, extractor type, focused and differentially pumped ion gun.

Preparation Chamber

» Preparation Chamber

For standard sample preparation techniques, thin film growth, sputtering, annealing and advanced preparation techniques with in-situ characterisation.

Multi-axes Special Design Manipulators

» Multi-axes Special Design Manipulators

The multi-axes manipulator designed for precision positioning of sample holders under UHV conditions.

» Electronics

Motion Control 6

» Motion Control 6

Electronic device for controlling up to 6 stepper motors.

Ion Source Power Supply IS40-PS

» Ion Source Power Supply IS40-PS

High stability & low noise power supply, which can be configured to work with IS40C1 or IS40E1 Ion Sources.

Ion Multi Gauge Controller MG15

» Ion Multi Gauge Controller MG15

Able to support 4 active gauges and up to 3 passive gauges, extending the measurement range to 2×10^-12 mbar.

Research Unit Digital Instrument RUDI-8M

» Research Unit Digital Instrument RUDI-8M

Modular, compact high voltage power supply for e.g. photoemission applications.

» Software

Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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