Analytical systems for synchrotrons

Super resolution ARPES system [project 158]

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Description

Customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.

Central radial distribution chamber with attached analytical chamber and auxiliary chambers allows transport of samples under true UHV conditions (pressure
Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS and LEED. Fabricated from mu-metal and designed for energy resolution better then 0.5 meV
Can be used in the laboratory as well as on a synchrotron beam line.
Horizontally mounted analyser can be easily rotated by 90 degrees.
The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER)

Related products

» Systems

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

» Super resolution ARPES system [project 158]

Customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.

» High resolution UPS and XPS system [project 317]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.