Deposition systems

Advanced, multi-technique systems for UHV surface science

UHV deposition system [project 364]

» UHV deposition system [project 364]

UHV deposition system dedicated to accurate and reproducible thin film layer deposition.

Deposition system with door access [project 244]

» Deposition system with door access [project 244]

Deposition system which offers the flexibility of several techniques in a single chamber.

Deposition system with door access [project 236]

» Deposition system with door access [project 236]

Deposition system offer the flexibility of several techniques in a single chamber.

Deposition system with door access [project 124]

» Deposition system with door access [project 124]

Deposition system which offers the fexibility of several techniques in a single chamber.

HIPIMS system [project 335]

» HIPIMS system [project 335]

The HIPIMS Reactor is a dual purpose deposition chamber. It allows accurate and reproducible thin film layer deposition and extensive plasma diagnostic investigation.

Deposition system with door access [project 334]

» Deposition system with door access [project 334]

Deposition system which offers the flexibility of several techniques in a single chamber.

MBE system [project 242]

» MBE system [project 242]

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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