Deposition systems

Advanced, multi-technique systems for UHV surface science

» Magnetron sputtering system [project 229]

Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition.

» Deposition cluster tool [project 228]

MBE multi-chamber system for metallic multi-layers from magnetic materials. Features in-situ characterisation of sample magnetic properties, topography and crystallography.

» PLD system [project 224]

Multi-chamber system for designed for possibility of deposition of layers of metallic, semiconducting and dielectric PLD method and deposit layers and layer structures composed of several different materials in the configuration of DIBS

» PLD system [project 198]

UHV cluster with PLD chamber and mobile preparation chamber.

» Magnetron sputtering system [project 128]

The magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

» Deposition system with door access [project 116]

The system is versatile R&D tool offering the flexibility of multi-deposition techniques in a single platform.

» UHV system [project 063]

Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.

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