Deposition systems

Advanced, multi-technique systems for UHV surface science

» HIPIMS system [project 335]

The HIPIMS Reactor is a dual purpose deposition chamber. It allows accurate and reproducible thin film layer deposition and extensive plasma diagnostic investigation.

» Deposition system with door access [project 334]

Deposition system which offers the flexibility of several techniques in a single chamber.

» MBE system [project 242]

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

» Magnetron sputtering system [project 229]

Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition.

» Deposition cluster tool [project 228]

MBE multi-chamber system for metallic multi-layers from magnetic materials. Features in-situ characterisation of sample magnetic properties, topography and crystallography.

Multi-chamber system for designed for possibility of deposition of layers of metallic, semiconducting and dielectric PLD method and deposit layers and layer structures composed of several different materials in the configuration of DIBS

» PLD system [project 198]

UHV cluster with PLD chamber and mobile preparation chamber.

‹ 1 2 3 4 5 ›