Deposition systems

Advanced, multi-technique systems for UHV surface science
Sputter Deposition System <br> [project 525]

» Sputter Deposition System
[project 525]

Sputter-down system equipped with 4 magnetrons and easy access to top flange, bottom flange and substrate stage.

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UHV multichamber cluster tool [project 526]

» UHV multichamber cluster tool [project 526]

Multichamber deposition setup with tunnel transferring system.

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MBE system [project 531]

» MBE system [project 531]

Stand-alone MBE sytem with fast intro chamber.

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HV Sputtering System <br> [project 518]

» HV Sputtering System
[project 518]

High-vacuum sputtering system for the deposition of non-magnetic metals and dielectrics, with capability to carry at least four sputtering sources.

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PLD system [project 465]

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

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UHV Deposition System [project 464]

» UHV Deposition System [project 464]

The UHV Deposition System including Integrated Ion-Beam Patterning, UHV Thin Film Growth Chamber and Characterization Tools with Accessories dedicated to accurate and reproducible thin film layer deposition.

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Deposition system with fully automated process control [project 458]

» Deposition system with fully automated process control [project 458]

Deposition HV system dedicated for: DC magnetron sputtering, RF magnetron sputtering, reactive sputtering and evaporation using electron beam.

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