Deposition systems

Advanced, multi-technique systems for UHV surface science
Deposition cluster tool [project 228]

» Deposition cluster tool [project 228]

MBE multi-chamber system for metallic multi-layers from magnetic materials. Features in-situ characterisation of sample magnetic properties, topography and crystallography.

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UHV system [project 063]

» UHV system [project 063]

Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.

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Deposition system with door access [project 116]

» Deposition system with door access [project 116]

The system is versatile R&D tool offering the flexibility of multi-deposition techniques in a single platform.

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Magnetron sputtering system [project 229]

» Magnetron sputtering system [project 229]

Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition.

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HIPIMS system [project 335]

» HIPIMS system [project 335]

The HIPIMS Reactor is a dual purpose deposition chamber. It allows accurate and reproducible thin film layer deposition and extensive plasma diagnostic investigation.

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Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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Magnetron sputtering system [project 128]

» Magnetron sputtering system [project 128]

The magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

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MBE system [project 242]

» MBE system [project 242]

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

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