Deposition systems

Advanced, multi-technique systems for UHV surface science
UHV Deposition System [project 464]

» UHV Deposition System [project 464]

The UHV Deposition System including Integrated Ion-Beam Patterning, UHV Thin Film Growth Chamber and Characterization Tools with Accessories dedicated to accurate and reproducible thin film layer deposition.

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Deposition system with fully automated process control [project 458]

» Deposition system with fully automated process control [project 458]

Deposition HV system dedicated for: DC magnetron sputtering, RF magnetron sputtering, reactive sputtering and evaporation using electron beam.

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PLD system [project 451]

» PLD system [project 451]

High resolution Photoemision Spectrometer integrated with in-situ thin film pulsed layer deposition set up.

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PLD system [project 465]

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

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UHV deposition system [project 373]

» UHV deposition system [project 373]

Modular platform for thin layers deposition.

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Deposition system for plasma evaporation [project 383]

» Deposition system for plasma evaporation [project 383]

RF PACVD System for deposition of carbon layers onto surface of medical implants made of the AISI316L medical steel.

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UHV system for thin film evaporation [project 382]

» UHV system for thin film evaporation [project 382]

Customized deposition system dedicated for thin films organic materials deposition.

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Deposition system with door access [project 368]

» Deposition system with door access [project 368]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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