Deposition systems

MBE system [project 242]

Description

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

Specification

The UHV system comprises a process chamber with ancillary equipment together with a load lock chamber. The process chamber base pressure is guaranteed better in the 10-10 mbar range. The system is equipped with several EBV sources, EF cells and High power E-guns. The deposition process can be controlled over a wide temperature range, from LN2 up to 1000˚C. A unique feature of the system is that the source mounting stage on the bottom face of the chamber is designed so that it can be effortlessly exchanged. Software (PLC based) allows for complete freedom in creating programs. The user can define a sequence of steps carried out on any device registered in the system. In addition, sequences can be stacked in the program, where it is possible to call cyclical individual sequences and whole groups. The process editor allows many different types of operation on the sequences: copy, move (changing the order of calls), remove, steps edit etc..

  • The deposition chamber is equipped with numerous ports for diagnostics and ancillary equipment. The different ports in CF standard located on the bottom of the chamber are occupied by 2 Electron Beam Evaporators, three Effusions Cells and one E-gun.
  • The load lock chamber is suitable for powdered samples and includes an internal bakeout system.

 

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