Deposition systems

PLD system [project 198]

UHV cluster with PLD chamber and mobile preparation chamber.

Transferring system

PTS Sample holders, also adapters for flag style sample holders

System configuration

- PLD chamber:

  • 5-axis motorized manipulator with integrated quartz balance and shutter for wedge growth
  • Target manipulator (for six 1” targets), motorized
  • Diode laser for sample heating up to 1200K
  • KrF excimer laser COMPex Pro 201F
  • 30keV RHEED
  • Gas dosing system
  • Computer control

- Radial Distribution Chamber for transferring the samples between attached chambers under UHV conditions

- Load Lock chamber which allows to load up to 3 PTS sample holders/target holders

- Storage Chamber including park mechanism for 10 PTS sample holders/target holders

- Two-level Preparation chamber (mobile):

  • High precision 5-axis manipulator with LN2 cooling and possibility of heating up to 2000°C
  • LEED/Auger
  • Ion sputter source for sample cleaning
  • Small load lock chamber
  • RGA 100AMU

- Accessories:

  • Set of sample holders
  • Bakeout system
  • 19" rack cabinets for all electronic units
  • Support frame
  • LED lighting

Related products

» Systems

PEAXIS system [project 459]

» PEAXIS system [project 459]

PREVAC PEAXIS endstation system is a combination of XAS, RIXS and AdXPS techniques.

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UHV deposition system [project 364]

» UHV deposition system [project 364]

UHV deposition system dedicated to accurate and reproducible thin film layer deposition.

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UHV system for thin film evaporation [project 382]

» UHV system for thin film evaporation [project 382]

Customized deposition system dedicated for thin films organic materials deposition.

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PLD system [project 465]

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

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» Components

PTS SPM DIR/C-K sample holder

» PTS SPM DIR/C-K sample holder

The PTS SPM DIR/C-K Sample Holder is for SPM work and is equipped with direct sample heating and cooling over the range -170°C to 1200°C.

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Magnetron Source MS2 63C1

» Magnetron Source MS2 63C1

New 2-inch magnetron source for applying thin layers with high homogeneity in the sputtering process.

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PTS 1400 OMC EB/C-K sample holder

» PTS 1400 OMC EB/C-K sample holder

The PTS 1400 OMC EB/C-K sample holder adapts to flag style sample holders for systems that are equipped with STM.

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Hemispherical Energy Analyser EA15-HP50

» Hemispherical Energy Analyser EA15-HP50

The EA15-HP50 allows high-resolution PES measurements in static and dynamic environments up to 50 mbar.

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» Electronics

Ion Multi Gauge Controller MG15

» Ion Multi Gauge Controller MG15

Able to support 4 active gauges and up to 3 passive gauges, extending the measurement range to 2×10-12 mbar.

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UV Source Power Supply UV40A-PS

» UV Source Power Supply UV40A-PS

For controlling the UV source UV40A1 in ultraviolet photoelectron spectroscopy (UPS) applications.

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Thickness Monitors TM13 & TM14

» Thickness Monitors TM13 & TM14

The TM13 and TM14 devices comprise: quartz oscillator, frequency measuring system and communication interface.

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X-ray Source Emission Controller XR40B-EC

» X-ray Source Emission Controller XR40B-EC

The XR40B-EC electronic unit controls the X-ray source emission current.

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» Software

Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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See more  ›

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