Deposition systems

Deposition system with door access [project 334]

Our family of deposition systems offer the flexibility of several techniques in a single chamber. Each system in the range features a universal mounting flange (320 mm dia.) which can be configured for specific deposition 
techniques or combination of
techniques. A modular, user friendly
 approach to system design means that
 the entire system can be reconfigured by 
simply changing the universal mounting flange,
a process that has been made both fast and 
simple. For demanding applications that require UHV base pressures, the systems can also be configured with appropriate sealing and pumping systems to achieve a guaranteed minimum of 10-9 mbar.

A unique feature of these systems is that the source mounting stage on the bottom face of the chamber is designed so that it can be effortlessly exchanged with matching stages that are configured with thermal, e-beam or combination sources, providing a truly multi-technique, multi-deposition system that is ideal for both small scale production and R&D prototyping. Systems are equipped with a transfer port for future connection to e.g. UHV cluster apparatus.

The systems can be configured with:

  • thermal evaporation boats
  • magnetron sources

  • crucibles
  • effusion cells

  • e-beam sources
  • combinations of the above

Each source type can be equipped with manual or automatic shutters and the entire system can also be supplied with semi-automatic or fully-automatic control via pneumatic actuation. A wealth of spare flanges and viewports enable future expansion and ancillary equipment to be mounted whilst the deposition chamber itself is equipped with a large, easy access vacuum door which has differential pumping. This maintains an excellent base pressure whilst providing easy access to the internals. The system also employs efficient double wall water cooling throughout.

In the standard configuration the chamber is equipped for multi-sample mounting via 1′′ or 2′′ substrate holders but other sizes can be accommodated on request.

There are a range of sample manipulator options to provide the widest possible access to substrate conditions including full 360 degree rotation with stage heating and cooling.

The free chamber ports can be populated with a range of instrumentation including:

  • ion sources
  • thickness monitor
  • residual analyser
  • load lock chamber with transfer
  • gas dosing system

The systems are delivered with all necessary power supplies and control units in a stand-alone 19′′ cabinet system with fully interlocked and protected vacuum, process and vent control.

A comprehensive PC control and data acquisition system is available as an option and also allows ancillary techniques and devices to be fully integrated.

Related products

» Systems

XPS UPS Photoelectron Spectrometer [project 454]

» XPS UPS Photoelectron Spectrometer [project 454]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

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IR system [project 075]

» IR system [project 075]

A system designed for IR measurements.

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Sputter Deposition System <br> [project 525]

» Sputter Deposition System
[project 525]

Sputter-down system equipped with 4 magnetrons and easy access to top flange, bottom flange and substrate stage.

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UHV system for in-situ studies of nanostructures by nuclear resonance scatering of synchrotron radiation [project 015]

» UHV system for in-situ studies of nanostructures by nuclear resonance scatering of synchrotron radiation [project 015]

Ultra high vacuum system for preparation, characteri­sation and investigation of the growth, diffusion, lattice dynamics and magnetism in thin films and nano-struc­tured samples.

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See more  ›

» Components

PTS BASE CONTAINER sample holder

» PTS BASE CONTAINER sample holder

The PTS BASE CONTAINER SAMPLE HOLDER is designed as an adapter to accept samples up to 50mm diameter and 7.5mm thick.

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Slit Unit Manipulators

» Slit Unit Manipulators

Single axis manipulators for adjusting the shape of cross-sectional area of the beam.

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4-6 axes Helium Manipulators (Closed Cycle)

» 4-6 axes Helium Manipulators (Closed Cycle)

Spectroscopy UHV manipulators with heating and LHe cooling (closed cycle) possibility.

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PTS POWDER sample holder

» PTS POWDER sample holder

The PTS POWDER SAMPLE HOLDER is designed for powder samples that do not require heating or cooling.

read more
See more  ›

» Electronics

Bakeout Control Unit BCU14

» Bakeout Control Unit BCU14

Perfect unit dedicated for heating zones of the vacuum systems as well as heating samples inside the preparation chambers.

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X-ray Source Electronics Set XR40B

» X-ray Source Electronics Set XR40B

XR40B electronics set is used to control the X-ray source RS 40B1.

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Electron Beam Evaporator Power Supply EBV40A-PS

» Electron Beam Evaporator Power Supply EBV40A-PS

Designed for supplying Electron Beam Evaporator EBV40A used for evaporation of materials under UHV conditions.

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Ion Source Power Supply IS40-PS

» Ion Source Power Supply IS40-PS

High stability & low noise power supply, which can be configured to work with IS40C1 or IS40E1 Ion Sources.

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See more  ›

» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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See more  ›

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