Deposition systems

Deposition system with door access [project 365]

UHV sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from two special design electron source.

Transferring system:

The chamber is equipped with a large, easy access vacuum door which is dual viton sealed with differential pumping in the seal interspace. This maintains an excellent base pressure whilst providing perfect internal access. A unique feature of these systems is that all the source are mounting on the bottom flange of the chamber which can be effortlessly exchanged.

Wafers for sample up to 3’’ with different shapes.

System configuration:

- Processing chamber with base pressure range <2*10-7 mbar:

  • High precision manipulator with continuous azimuthal rotation and heating up to 300°C
  • Special internal storage up to four 3’’ wafers
  • 2 x electron source working independently or integrated
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Automatic Gas dosing system
  • The deposition process is fully programmable via dedicated PC software and PLC controller.

- Accessories:

  • Special rack for all electronics units
  • Chiller
  • Special design frame adjust for

 

Related products

» Systems

High Pressure Photoemission Spectroscopy UHV System [project 487]

» High Pressure Photoemission Spectroscopy UHV System [project 487]

Superior performance analysis system for high pressure photoemission spectroscopy.

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Deposition system with door access [project 244]

» Deposition system with door access [project 244]

Deposition system which offers the flexibility of several techniques in a single chamber.

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UHV system [project 434]

» UHV system [project 434]

Sample transport system for a UHV sample preparation facility with UHV surface preparation and analysis module.

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PLD system [project 538]

» PLD system [project 538]

Ultra high vacuum system dedicated for Pulsed Laser Deposition.

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» Components

Mirror/Gratings System Manipulators

» Mirror/Gratings System Manipulators

Multi-axis manipulator in order to determine the correct direction of the beam.

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Ion Source IS 40E1

» Ion Source IS 40E1

Two lens, extractor type, focused and differentially pumped ion gun.

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1-3 axes Manipulators

» 1-3 axes Manipulators

Wide range of customised UHV manipulators with up to three othogonal axes XYZ.

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PTS 700/-90 HPC RES/C-K RG sample holder

» PTS 700/-90 HPC RES/C-K RG sample holder

The PTS HPC RES/C-K RG sample holder is dedicated for the High Pressure Cell (reactor).

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» Electronics

Vacuum Chamber Highlight VCH-10

» Vacuum Chamber Highlight VCH-10

Perfect accessory for illuminating sample areas, source/accessory positions and movement regions within a UHV system.

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Magnetron Power Supply M600DC-PS

» Magnetron Power Supply M600DC-PS

Compact switch-mode power supply designed to drive up to 3 magnetron sources.

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Power Control Unit PCU16

» Power Control Unit PCU16

Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

 

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X-ray Cooling Controller XRCB-02

» X-ray Cooling Controller XRCB-02

The XRCB-02 Cooling Controller is mainly used to cooling control of the X-ray sources.

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» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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See more  ›

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