Deposition systems

Deposition system with door access [project 365]

UHV sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from two special design electron source.

Transferring system:

The chamber is equipped with a large, easy access vacuum door which is dual viton sealed with differential pumping in the seal interspace. This maintains an excellent base pressure whilst providing perfect internal access. A unique feature of these systems is that all the source are mounting on the bottom flange of the chamber which can be effortlessly exchanged.

Wafers for sample up to 3’’ with different shapes.

System configuration:

- Processing chamber with base pressure range <2*10-7 mbar:

  • High precision manipulator with continuous azimuthal rotation and heating up to 300°C
  • Special internal storage up to four 3’’ wafers
  • 2 x electron source working independently or integrated
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Automatic Gas dosing system
  • The deposition process is fully programmable via dedicated PC software and PLC controller.

- Accessories:

  • Special rack for all electronics units
  • Chiller
  • Special design frame adjust for

 

Related products

» Systems

PLD system [project 465]

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

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Multi-technique UHV surface analysis system [project 338]

» Multi-technique UHV surface analysis system [project 338]

Multitechnique UHV system offering a wide range of surface characterisation techniques including XPS, UPS, ARPES, LEED.

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Accelerator-analytical UHV system [project 412]

» Accelerator-analytical UHV system [project 412]

An analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

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See more  ›

» Components

PTS STANDARD sample holder

» PTS STANDARD sample holder

The PTS STANDARD sample holder for easy sample mounting and optional BIAS current measurement.

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PTS 1000 IR RES/C-K sample holder

» PTS 1000 IR RES/C-K sample holder

The PTS 1000 IR RES/C-K Sample Holder is designed specifically for optical transmission spectroscopy (IR, UV) over the temperature range –170°C to 1000°C.

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Quartz Balance QO 40A1

» Quartz Balance QO 40A1

The Quartz Balance QO 40A1 provides a real-time, progressive indication of coating thickness during deposition, for high accuracy and reproducibility in coatings production.

 
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Beam Flux Monitor

» Beam Flux Monitor

The Beam Flux Monitor enables measurement of the beam equivalent pressure (BEP) in MBE applications.

read more
See more  ›

» Electronics

X-ray Source Emission Controller XR40B-EC

» X-ray Source Emission Controller XR40B-EC

The XR40B-EC electronic unit controls the X-ray source emission current.

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Electron Beam Evaporator Power Supply EBV40A-PS

» Electron Beam Evaporator Power Supply EBV40A-PS

Designed for supplying Electron Beam Evaporator EBV40A used for evaporation of materials under UHV conditions.

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Ion Multi Gauge Controller MG13

» Ion Multi Gauge Controller MG13

Supports 2 vacuum gauges: one Bayard-Alpert gauge and any others existing gauge on the market based on 0÷10 V output standard.

read more
Bakeout Control Unit BCU14

» Bakeout Control Unit BCU14

Perfect unit dedicated for heating zones of the vacuum systems as well as heating samples inside the preparation chambers.

read more
See more  ›

» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

read more
Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

read more
Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

read more
See more  ›

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