Deposition systems

Deposition system with door access [project 368]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

Transferring system:

The chamber is equipped with a large, easy access vacuum door which is dual viton sealed with differential pumping in the seal interspace. This maintains an excellent base pressure whilst providing perfect internal access. A unique feature of these systems is that all the source are mounting on the bottom flange of the chamber which can be effortlessly exchanged.

Wafers for sample up to 3’’ with different shapes.

 

 

System configuration:

- Processing chamber with base pressure range <2*10-7 mbar:

  • High precision manipulator with continuous azimuthal rotation and heating up to 300°C
  • Special internal storage up to four 3’’ wafers
  • 2 x 3’’ magnetrons sources
  • 2 x thermal evaporation boats
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Automatic Gas dosing system
  • The deposition process is fully programmable via dedicated PC software and PLC controller.

- Accessories:

  • Special rack for all electronics units
  • Chiller
  • Special design frame adjust for trolley using for easy disassembling bottom flange with sources

Related products

» Systems

UHV multichamber system [project 422]

» UHV multichamber system [project 422]

Multitechnique UHV system for FTIR investigations, equipped with MBE chamber and preparation module.

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ARPES UHV system [project 418]

» ARPES UHV system [project 418]

 

The Ultra-high resolution Angle Resolved Photoemission Spectroscopy (ARPES) system.

 

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UHV Multichamber XPS - IR system [project 256]

» UHV Multichamber XPS - IR system [project 256]

Multitechnique IR-UHV system offering a wide range of surface characterisation techniques.

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Custom UHV system for OLED research [project 014]

» Custom UHV system for OLED research [project 014]

A custom multichamber UHV system for the preparation and investigation of organic films (OLEDs).

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» Components

Preparation Chamber

» Preparation Chamber

For standard sample preparation techniques, thin film growth, sputtering, annealing and advanced preparation techniques with in-situ characterisation.

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Beam Flux Monitor

» Beam Flux Monitor

The Beam Flux Monitor enables measurement of the beam equivalent pressure (BEP) in MBE applications.

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PTS 1000 RES/C-K sample holder

» PTS 1000 RES/C-K sample holder

The PTS 1000 RES/C-K sample holder has indirect (resistive) sample heating up to 1000°C and cooling to –170°C.

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Special Chambers

» Special Chambers

Custom designed and fabricated UHV chambers and complete vacuum systems for a wide range of applications.

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» Electronics

Electron Beam Evaporator Power Supply EBV40A-PS

» Electron Beam Evaporator Power Supply EBV40A-PS

Designed for supplying Electron Beam Evaporator EBV40A used for evaporation of materials under UHV conditions.

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Thickness Monitors Controller TMC-13

» Thickness Monitors Controller TMC-13

Newest technology electronics designed for monitoring and controlling any coating and deposition processes.

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Electron Source Power Supply ES40-PS

» Electron Source Power Supply ES40-PS

Allows fine adjustment of electron beam energy, density, position on the sample and also beam profile

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X-ray Cooling Controller XRCB-02

» X-ray Cooling Controller XRCB-02

The XRCB-02 Cooling Controller is mainly used to cooling control of the X-ray sources.

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» Software

Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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