Deposition systems

Deposition system with door access [project 368]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

Transferring system:

The chamber is equipped with a large, easy access vacuum door which is dual viton sealed with differential pumping in the seal interspace. This maintains an excellent base pressure whilst providing perfect internal access. A unique feature of these systems is that all the source are mounting on the bottom flange of the chamber which can be effortlessly exchanged.

Wafers for sample up to 3’’ with different shapes.

 

 

System configuration:

- Processing chamber with base pressure range <2*10-7 mbar:

  • High precision manipulator with continuous azimuthal rotation and heating up to 300°C
  • Special internal storage up to four 3’’ wafers
  • 2 x 3’’ magnetrons sources
  • 2 x thermal evaporation boats
  • Deposition rate measurement system: Quartz Balance and Thickness monitor
  • Automatic Gas dosing system
  • The deposition process is fully programmable via dedicated PC software and PLC controller.

- Accessories:

  • Special rack for all electronics units
  • Chiller
  • Special design frame adjust for trolley using for easy disassembling bottom flange with sources

Related products

» Systems

PLD system [project 198]

» PLD system [project 198]

UHV cluster with PLD chamber and mobile preparation chamber.

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Customised multitechnique UHV system [092]

» Customised multitechnique UHV system [092]

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

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Deposition system with door access [project 124]

» Deposition system with door access [project 124]

Deposition system which offers the fexibility of several techniques in a single chamber.

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Tribometer system [project 504]

» Tribometer system [project 504]

Module for study of tribological properties between two surfaces in UHV or ambient pressure conditions.

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» Components

PTS 200 RES sample holder

» PTS 200 RES sample holder

The PTS 200 RES sample holder features a heated, rotating wire of 129mm L and 0.5mm dia (max) for vapor deposition experiments.

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High Pressure Cell Manipulators

» High Pressure Cell Manipulators

Specially designed 3-axes high pressure cell manipulator with IR laser heating possibility.

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PTS 1200 DIR/C-K sample holder

» PTS 1200 DIR/C-K sample holder

The PTS with Direct Heating holder allows direct heating of the sample up to 1200°C and cooling down to -170°C.

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Slit Unit Manipulators

» Slit Unit Manipulators

Single axis manipulators for adjusting the shape of cross-sectional area of the beam.

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» Electronics

X-ray Source Electronics Set XREC20

» X-ray Source Electronics Set XREC20

XREC20 electronics set dedicated for controlling SAX X-ray sources.

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X-ray High Voltage Power Supply XRHV01-PS

» X-ray High Voltage Power Supply XRHV01-PS

High voltage power supply for X-ray source RS 40B1.

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Ion Multi Gauge Controller MG15

» Ion Multi Gauge Controller MG15

Able to support 4 active gauges and up to 3 passive gauges, extending the measurement range to 2×10-12 mbar.

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X-ray Cooling Box XRCB-02

» X-ray Cooling Box XRCB-02

The XRCB-02 Cooling Box is mainly used to cooling control of the X-ray sources.

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See more  ›

» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

read more
See more  ›

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