Sputter deposition system [project 500]
Magnetron sputtering system dedicated to film layer deposition.
PTS sample holder for up to 6" wafers (with different shapes).
- Processing chamber with base pressure range <5*10-8 mbar:
- High precision, motorised 2-axes manipulator with continuous azimuthal rotation and heating up to 800°C (depends on the sample holder type)
- 8 x 2" magnetrons sources
- 2 x thermal evaporation boats
- Deposition rate measurement system: Quartz Balance and Thickness monitor
- Automatic Gas dosing system
- The deposition process is fully programmable via dedicated PC software and PLC controller.
- Special lifting trolley for mounting and dismounting bottom flange with the sources.
- Linear transfer
- Special rack for all electronics units
- Special design frame adjust for trolley using for easy disassembling bottom flange with sources