Deposition systems

Magnetron Sputtering System
[project 533]

System for research and development for thin film coating of substrate with different materials.

Deposition system prepared for planar and confocal „sputter down” arrangement and compatible with photolithographic lift-off process technology.

 

  • Fully automated transferring and deposition process
  • Process chamber with five DN 160CF ports for magnetrons, equipped with shields against cross contamination and vacuum door for quick and easy access to all components mounted in the chamber
  • Base pressure: <5 x 10-7 mbar
  • Substrate holder manipulator with 2 stations (for planar and confocal sputtering geometry). Stations are ready to carry up to 100 mm diameter wafers or 50x50 mm cylindrical substrates. Both stations have thermal stabilisation.
  • Load lock/storage for up to 6 holders with easy access door

 

Control software Synthesium for full control over process recipes and monitoring, manipulating all relevant subsystems.

The deposition chamber is equipped with additional CF ports for e.g. analysis instruments.

Related products

» Systems

PLD system [project 224]

» PLD system [project 224]

Multi-chamber system for designed for possibility of deposition of layers of metallic, semiconducting and dielectric PLD method and deposit layers and layer structures composed of several different materials in the configuration of DIBS

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Ultra High Resolution Photoemission Spectrometer [project 351]

» Ultra High Resolution Photoemission Spectrometer [project 351]

A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in low temperatures and UHV conditions.

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Super resolution ARPES system [project 158]

» Super resolution ARPES system [project 158]

Customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors.

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» Components

1-4 axes PLD Target Manipulators

» 1-4 axes PLD Target Manipulators

Designed for target positioning in pulsed laser deposition applications.

 

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XY Stages

» XY Stages

Precision, high rigidity UHV specimen translator having X and Y motions.

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PTS FARA sample holder

» PTS FARA sample holder

The PTS FARA sample holder has integrated Faraday Cup with secondary electron suppressor for beam profile measurements.

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Wobble Sticks with Gripping Arms

» Wobble Sticks with Gripping Arms

Used to grip and lift samples with a flat surface.

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» Electronics

Power Control Unit PCU16

» Power Control Unit PCU16

Compact, stand-alone microprocessor device for controlling UHV vacuum systems.

 

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Flood Source Power Supply FS40-PS

» Flood Source Power Supply FS40-PS

New power supply with touchscreen dedicated for Flood Source FS40A1.

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X-ray Cooling Box XRCB-02

» X-ray Cooling Box XRCB-02

The XRCB-02 Cooling Box is mainly used to cooling control of the X-ray sources.

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UV Source Power Supply UV40A-PS

» UV Source Power Supply UV40A-PS

For controlling the UV source UV40A1 in ultraviolet photoelectron spectroscopy (UPS) applications.

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» Software

Application for Thermal Desorption Spectroscopy

» Application for Thermal Desorption Spectroscopy

Used to control the power, preparing a recipe for heating and acquisition of measured data.

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Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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Spectrium

» Spectrium

Control and data acquisition software dedicated to EA15 class analysers.

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