Deposition systems

Magnetron Sputtering System in UHV standard [project 560]

UHV system designed for confocal and planar „sputter down” RF/DC/DC PULS deposition process.

  • Fully automated transferring system for 3-inch substrate holders.
  • Process chamber designed for eight 2-inch magnetrin sources (confocal geometry) and one 4-inch source in center/planar geometry.
       Chamber is equipped with:
        - double sealed differentially pumped vacuum door for quick and easy access to process chamber
        - special trolley for mounting and dismounting bottom flange with manipulator
        - mechanism for lift-off the top flange with the magnetron sources
        - exchangeable shield for easy cleaning the chamber
  • Background pressure: <3x10-8 mbar
  • Load lock/storage chamber for up to six 3 inch holders with easy-to-open lock door.
  • 2-axes manipulator for substrate holder, with controllable temperature and pneumatic shutter.
  • Gas dosing system for oxidation

 

Control software Synthesium for full control over process recipes and monitoring, manipulating all relevant subsystems.

Related products

» Manipulators

1-4 axes Sputtering Manipulators

» 1-4 axes Sputtering Manipulators

Designed for sputter deposition applications (including reactive sputtering).

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» Electronics

Magnetron Power Supply M600DC-PS

» Magnetron Power Supply M600DC-PS

Compact switch-mode power supply designed to drive up to 3 magnetron sources.

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» Components

Magnetron Source MS2 63C1

» Magnetron Source MS2 63C1

New 2-inch magnetron source for applying thin layers with high homogeneity in the sputtering process.

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» Software

Synthesium

» Synthesium

New software dedicated to vacuum deposition applications.

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» Systems

Deposition cluster tool [project 228]

» Deposition cluster tool [project 228]

MBE multi-chamber system for metallic multi-layers from magnetic materials. Features in-situ characterisation of sample magnetic properties, topography and crystallography.

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UHV system [project 063]

» UHV system [project 063]

Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.

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Deposition system with door access [project 116]

» Deposition system with door access [project 116]

The system is versatile R&D tool offering the flexibility of multi-deposition techniques in a single platform.

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Magnetron sputtering system [project 128]

» Magnetron sputtering system [project 128]

The magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

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Magnetron sputtering system [project 229]

» Magnetron sputtering system [project 229]

Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition.

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Automated deposition system

» Automated deposition system

Advanced research platform for thin film growth by MBE technology.

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HIPIMS system [project 335]

» HIPIMS system [project 335]

The HIPIMS Reactor is a dual purpose deposition chamber. It allows accurate and reproducible thin film layer deposition and extensive plasma diagnostic investigation.

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Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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MBE system [project 242]

» MBE system [project 242]

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

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PLD system [project 198]

» PLD system [project 198]

UHV cluster with PLD chamber and mobile preparation chamber.

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PLD system [project 224]

» PLD system [project 224]

Multi-chamber system for designed for possibility of deposition of layers of metallic, semiconducting and dielectric PLD method and deposit layers and layer structures composed of several different materials in the configuration of DIBS

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Deposition system with door access [project 334]

» Deposition system with door access [project 334]

Deposition system which offers the flexibility of several techniques in a single chamber.

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Deposition system with door access [project 124]

» Deposition system with door access [project 124]

Deposition system which offers the fexibility of several techniques in a single chamber.

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Deposition system with door access [project 236]

» Deposition system with door access [project 236]

Deposition system offer the flexibility of several techniques in a single chamber.

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Deposition system with door access [project 244]

» Deposition system with door access [project 244]

Deposition system which offers the flexibility of several techniques in a single chamber.

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UHV deposition system [project 364]

» UHV deposition system [project 364]

UHV deposition system dedicated to accurate and reproducible thin film layer deposition.

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Deposition system with door access [project 365]

» Deposition system with door access [project 365]

 

UHV sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from two special design electron source.

 

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Deposition system with door access [project 368]

» Deposition system with door access [project 368]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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UHV system for thin film evaporation [project 382]

» UHV system for thin film evaporation [project 382]

Customized deposition system dedicated for thin films organic materials deposition.

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Deposition system for plasma evaporation [project 383]

» Deposition system for plasma evaporation [project 383]

RF PACVD System for deposition of carbon layers onto surface of medical implants made of the AISI316L medical steel.

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UHV deposition system [project 373]

» UHV deposition system [project 373]

Modular platform for thin layers deposition.

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PLD system [project 465]

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

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PLD system [project 451]

» PLD system [project 451]

High resolution Photoemision Spectrometer integrated with in-situ thin film pulsed laser deposition set up.

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Deposition system with fully automated process control [project 458]

» Deposition system with fully automated process control [project 458]

Deposition HV system dedicated for: DC magnetron sputtering, RF magnetron sputtering, reactive sputtering and evaporation using electron beam.

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UHV Deposition System [project 464]

» UHV Deposition System [project 464]

The UHV Deposition System including Integrated Ion-Beam Patterning, UHV Thin Film Growth Chamber and Characterization Tools with Accessories dedicated to accurate and reproducible thin film layer deposition.

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HV Sputtering System <br> [project 518]

» HV Sputtering System
[project 518]

High-vacuum sputtering system for the deposition of non-magnetic metals and dielectrics, with capability to carry at least four sputtering sources.

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Sputter Deposition System <br> [project 525]

» Sputter Deposition System
[project 525]

Sputter-down system equipped with 4 magnetrons and easy access to top flange, bottom flange and substrate stage.

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MBE system [project 531]

» MBE system [project 531]

Stand-alone MBE system with fast intro chamber.

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Sputter deposition system [project 500]

» Sputter deposition system [project 500]

Magnetron sputtering system dedicated to thin film layer deposition.

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UHV multichamber cluster tool [project 526]

» UHV multichamber cluster tool [project 526]

Multichamber deposition setup with tunnel transferring system.

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Magnetron Sputtering System <br> [project 533]

» Magnetron Sputtering System
[project 533]

System for research and development for thin film coating of substrate with different materials.

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PLD system [project 538]

» PLD system [project 538]

Ultra high vacuum system dedicated for Pulsed Laser Deposition.

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032 PRIMS

» 032 PRIMS

Smart, Basic DC Sputtering System.

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Ion Milling System <br> [project 557]

» Ion Milling System
[project 557]

UHV system for sample surface ion etching with high homogeneity.

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Magnetron Sputtering System in UHV standard [project 560]

» Magnetron Sputtering System in UHV standard [project 560]

UHV system designed for confocal and planar „sputter down” RF/DC/DC PULS deposition process.

read more
Mini MBE system

» Mini MBE system

Compact and fully functional deposition unit for molecular beam epitaxy technique.

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