Deposition systems

Magnetron sputtering system [project 229]

Description

Magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

System configuration

  • Sputtering chamber
  • Sputtering chamber manipulator
  • IR chamber
  • Z-manipulator
  • Distribution chamber - UFO
  • Magazine chamber
  • Quartz balance
  • Multi-film thickness monitor
  • Quartz oscillator application for measurement and control
  • Adaption for IR spectrometer connection

Related products

» Manipulators

1-4 axes Sputtering Manipulators

» 1-4 axes Sputtering Manipulators

Designed for sputter deposition applications (including reactive sputtering).

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