Preparation Chamber

Preparation chambers provide versatile in-situ preparation facilities ranging from standard sample preparation techniques and thin film growth, sputtering and annealing, to advanced preparation techniques with in-situ characterisation.

They typically have numerous UHV ports (of various standard sizes) for the connection of various types of surface preparation techniques. They are designed typically for base pressures between 1×10-10 mbar and 1×10-11 mbar. Our standard versatile preparation chambers provide enough ports and facilities for most current and future requirements but we will also be happy to fabricate to your individual specifications.

Preparation chambers are typically equipped with:
• precision manipulator

• pumping system
 and pressure gauges
• electron beam evaporators
 and effusion cells
• quartz oscillator

• different type of analysers
• ion sources for surface cleaning
• viewports


this site uses cookie files.

We use information saved in cookie files, among others, in statistical purposes and in order to fit the service to individual needs of the user. In your browser you can change your cookie files settings.

Using the site without changing cookie files settings means they will be saved in device memory. More information with tips how to change settings can be found in Privacy policy.


Query list