Preparation chambers provide versatile in-situ preparation facilities ranging from standard sample preparation techniques and thin film growth, sputtering and annealing, to advanced preparation techniques with in-situ characterisation.
They typically have numerous UHV ports (of various standard sizes) for the connection of various types of surface preparation techniques. They are designed typically for base pressures between 1×10-10 mbar and 1×10-11 mbar. Our standard versatile preparation chambers provide enough ports and facilities for most current and future requirements but we will also be happy to fabricate to your individual specifications.
Preparation chambers are typically equipped with:
• precision manipulator
• pumping system and pressure gauges
• electron beam evaporators and effusion cells
• quartz oscillator
• different type of analysers
• ion sources for surface cleaning