Instruments

Electron beam evaporator EBV 40A1

Electron beam evaporator EBV 40A1

Technical data

Mounting flange DN 40CF (rotatable)
Temperature range (for evaporated materials) 160 °C – 2300 °C (3300 °C for molybdenum connector)
Filament current  typically 1.8 - 2.2 A, max 2.3 A
Evaporating rod diameter 2 mm standard (other on request), step 2 mm, wire feed 25 mm wire length 43 mm
Water cooling (required) water flow: > 0.5 l/min., temperature: 20-30 °C, max pressure: 6 bar
Exit aperture diameters set 1: ID 4, ID 6, ID 7.4 (standard) set 2: ID 10, ID 14, ID 19
Type of shutter manual or pneumatic
Power - 50 W for high vapor pressure materials
- up to 200 W for crucibles and thick wires
Energy range 1 – 1500 eV
Cathode type thoriated tungsten
Crucible type (option) Knudsen cell type made from: Mo, W, liner PBN, Al2O3 
Crucibles volume 0.07 ml
Evaporated materials all typical materials according to crucible type
Others - flux regulation via ion current incl. electrode, feedthrough, display unit and PID-regulator
- rear-loading evaporant
Insertion length min. 190 mm (other on request) OD: 34.8 mm
Deposition area dependent on working distance (e.g. 6 mm for distance 25 mm - ID 4, 33 mm for distance 75 mm - ID 19)
Working distance 25 - 75 mm (optimum)
Bakeout temperature up to 250°C
Working pressure <10-5 mbar

The electron beam evaporator EBV 40A1 is designed for ultra-pure sub-monolayer and multilayer thin film growth by molecular beam epitaxy.

The precisely defined evaporant beam means highly uniform deposition on the sample, the deposition area being determined by the distance from the E-beam evaporator to the sample and the choice of one of the easily exchangeable exit apertures. The electron beam evaporator EBV 40A1 is configured with choice of manual or automatic shutter. Custom insertion length 190 - 345 mm (other on request).

Features

  • Manual or electro-pneumatic shutter, integrated flux monitor
  • W/Th-filament for evaporation from rod material or from small conductable crucible
  • Wide range of exchangeable exit apertures
  • Integral water cooling
  • Suitable for various materials
  • Unique high reliability design
  • Extremely high power densities
  • Extremely high power densities

Options

  • Customised insertion length
  • With or without integrated manual/electro-pneumatic shutter
  • Linear shift
  • Crucibles

Download brochure

Related products

» Electronics

Electron Beam Evaporator Power Supply EBV40A-PS

» Electron Beam Evaporator Power Supply EBV40A-PS

Designed for supplying Electron Beam Evaporator EBV40A used for evaporation of materials under UHV conditions.

read more
See more  ›

TOP

Important:
this site uses cookie files.

We use information saved in cookie files, among others, in statistical purposes and in order to fit the service to individual needs of the user. In your browser you can change your cookie files settings.

Using the site without changing cookie files settings means they will be saved in device memory. More information with tips how to change settings can be found in Privacy policy.

Close

Query list

Ask