Instruments

Magnetron Source MS2 63C1

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Technical data

 

Mounting flange	DN 63 CF *
Max. power (DC mode)	400 W DC **
Max. power (RF mode)	400 W RF **
Max. voltage DC	1200 V
Connector DC/RF	type 7/16
Target     form     diameter     thickness     cooling	circular 2" (50.8 mm) ± 0.2 mm 1 - 6 mm indirect
Water flow	min. 1l/min
Max. inlet water temperature	< 28 °C
Max. water pressure	3 bar
Tubing diameter	Ø6×1 mm PTFE
Magnet material	Neodymium Iron Boride (NdFeB)
Magnet max. temperature	200 °C
Internal pneumatic shutter	yes - dome type shutter
Insitu tilt module	yes, range +45° ÷ -10°
Chimney	yes
Typical rates      Cu, 140 mm distance      Ti, 140 mm distance	45 nm/min @ 300 W 30 nm/min @ 300 W
Internal gas inlet	yes (VCR standard)
Working gas	Ar
Max. working pressure	5×10-3 - 1×10-1 mbar
Optimal working pressure	5×10-3 - 5×10-2 mbar

* Other mounting flange on request (DN 100 CF, DN 160 CF).
** The maximum power is determined by the target material.

The MS2 63C1 Magnetron Source is used to apply thin layers with high homogeneity in the sputtering process.

The source is compatible with UHV conditions. Thanks to the integrated in situ tilt system, it can be used in both standard and custom geometry chambers. By using the dome type design we minimize the space needed to open the shutter. MS2 63C1 is fully compatible with our M600DC-PS power supply as well as all other DC, RF and pulsed DC power supplies available on the market.

Features

• Mounting flange: DN 63 CF
• In situ tilt range: +45° ÷ -10°
• Chimney as standard
• Pneumatic dome type shutter
  
  Targets:
• Diameter: 2"
• Thickness | non-magnetic: 1-6 mm
• Thickness | magnetic: Fe 1 mm, Co 2-3 mm, Ni 2 mm
• Indirectly cooled

Options

• Mass Flow Controller (MKS MF1)
• Z manipulator

Download brochure

Check our multifunctional switch-mode DC power supply M600DC-PS, to drive up to 3 magnetron sources.

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