Magnetron Source MS2 100 ISO-K
Technical data
| Mounting flange | DN 100 ISO-K * |
| Max. power (DC mode) | 400 W DC ** |
| Max. power (RF mode) | 400 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target form diameter thickness cooling |
circular 2" (50.8 mm) ± 0.2 mm 1 - 6 mm indirect |
| Water flow | min. 1l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | Ø6×1 mm PTFE |
| Magnet material | Neodymium Iron Boride (NdFeB) |
| Magnet max. temperature | 200 °C |
| Internal pneumatic shutter | yes - dome type shutter |
| Insitu tilt module | no |
| Chimney | yes |
| Typical rates Cu, 140 mm distance Ti, 140 mm distance |
45 nm/min @ 300 W 30 nm/min @ 300 W |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3 - 1×10-1 mbar |
| Optimal working pressure | 5×10-3 - 5×10-2 mbar |
* Other mounting flange on request.
** The maximum power is determined by the target material.
The MS2 100 ISO-K Magnetron Source is used to apply thin layers with high homogeneity in the sputtering process.
The source is compatible with UHV conditions. By using the dome type design we minimize the space needed to open the shutter. MS2 100 ISO-K is fully compatible with our M600DC-PS power supply as well as all other DC, RF and pulsed DC power supplies available on the market. Design without tilt module.
Features
- Mounting flange: DN 100 ISO-K
- Chimney as standard
- Pneumatic dome type shutter
Targets: - Diameter: 2"
- Thickness | non-magnetic: 1-6 mm
- Thickness | magnetic: Fe 1 mm, Co 2-3 mm, Ni 2 mm
- Indirectly cooled
Options
- Mass Flow Controller (MKS MF1)
- Z manipulator
Download brochure with magnetron sputtering set: MS2 63C1 with power supply.
Check our multifunctional switch-mode DC power supply M600DC-PS, to drive up to 3 magnetron sources.
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