Techniques

Find your system based upon a combination of analysis techniques.
Multichamber ESCA UHV system [project 053]

» Multichamber ESCA UHV system [project 053]

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

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Multifunctional UHV system [project 093]

» Multifunctional UHV system [project 093]

Multifunctional UHV system for range of studies.

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HIPIMS system [project 335]

» HIPIMS system [project 335]

The HIPIMS Reactor is a dual purpose deposition chamber. It allows accurate and reproducible thin film layer deposition and extensive plasma diagnostic investigation.

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Multichamber ARPES UHV system [project 072]

» Multichamber ARPES UHV system [project 072]

A system  designed for ARPES research

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Multichamber XPS UHV system [project 097]

» Multichamber XPS UHV system [project 097]

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

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Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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Magnetron sputtering system [project 128]

» Magnetron sputtering system [project 128]

The magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

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MBE system [project 242]

» MBE system [project 242]

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

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