Techniques

Find your system based upon a combination of analysis techniques.
Deposition system with door access [project 334]

» Deposition system with door access [project 334]

Deposition system which offers the flexibility of several techniques in a single chamber.

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PLD system [project 224]

» PLD system [project 224]

Multi-chamber system for designed for possibility of deposition of layers of metallic, semiconducting and dielectric PLD method and deposit layers and layer structures composed of several different materials in the configuration of DIBS

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PLD system [project 198]

» PLD system [project 198]

UHV cluster with PLD chamber and mobile preparation chamber.

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XPS system [project 090]

» XPS system [project 090]

This multifunctional system is designed for precise and varied analysis of material surfaces.

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MBE system [project 242]

» MBE system [project 242]

UHV standalone MBE system for metallic multi-layers from magnetic and nonmagnetic materials. System also features in-situ RHEED analysis.

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Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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High resolution UPS and XPS system [project 317]

» High resolution UPS and XPS system [project 317]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

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