Techniques

Find your system based upon a combination of analysis techniques.
Sputtering system [project 241]

» Sputtering system [project 241]

UHV magnetron sputtering system dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike.

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High resolution UPS and XPS system [project 317]

» High resolution UPS and XPS system [project 317]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

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Scanning XPS system [project 279]

» Scanning XPS system [project 279]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

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Multifunctional ESCA system [project 125]

» Multifunctional ESCA system [project 125]

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

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Multichamber ARPES UHV system [project 072]

» Multichamber ARPES UHV system [project 072]

A system  designed for ARPES research

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IR system [project 075]

» IR system [project 075]

A system designed for IR measurements.

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