Techniques

Find your system based upon a combination of analysis techniques.
ARTOF Analysis System [project 390]

» ARTOF Analysis System [project 390]

Dedicated system for ARTOF experiments with controllable sample temperature from 7 K to 400 K (PID controlled).

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PLD system [project 465]

» PLD system [project 465]

Combinatorial, high-throughput Pulsed Layer Deposition system for oxides and nitrides.

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Accelerator-analytical UHV system [project 412]

» Accelerator-analytical UHV system [project 412]

An analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

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PLD system [project 451]

» PLD system [project 451]

High resolution Photoemision Spectrometer integrated with in-situ thin film pulsed layer deposition set up.

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Deposition system with fully automated process control [project 458]

» Deposition system with fully automated process control [project 458]

Deposition HV system dedicated for: DC magnetron sputtering, RF magnetron sputtering, reactive sputtering and evaporation using electron beam.

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XPS UPS Photoelectron Spectrometer [project 454]

» XPS UPS Photoelectron Spectrometer [project 454]

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

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UHV Deposition System [project 464]

» UHV Deposition System [project 464]

The UHV Deposition System including Integrated Ion-Beam Patterning, UHV Thin Film Growth Chamber and Characterization Tools with Accessories dedicated to accurate and reproducible thin film layer deposition.

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