Techniques

Find your system based upon a combination of analysis techniques.
Sputter Deposition System [project 525]

» Sputter Deposition System [project 525]

Sputter-down system equipped with 4 magnetrons and easy access to top flange, bottom flange and substrate stage.

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Super resolution ARPES system with MBE chamber [project 523]

» Super resolution ARPES system with MBE chamber [project 523]

Multi-technique photo emission UHV system for super resolution ARPES measurements with integrated MBE chamber.

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HV Sputtering System [518]

» HV Sputtering System [518]

High-vacuum sputtering system for the deposition of non-magnetic metals and dielectrics, with capability to carry at least four sputtering sources.

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Tribometer system [project 504]

» Tribometer system [project 504]

Module for study of tribological properties between two surfaces in UHV or ambient pressure conditions.

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Spin coater [project 504]

» Spin coater [project 504]

Module for applying a uniform thin film to flat substrates.

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MOKE system [project 516]

» MOKE system [project 516]

UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

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1mbar XPS UPS system [project 522]

» 1mbar XPS UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 1 mbar - 10-10 mbar with controllable sample temperature.

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XPS UPS system [project 511]

» XPS UPS system [project 511]

System dedicated for XPS (ESCA)/UPS experiments in UHV conditions with controllable sample temperature.

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